Efficiency enhancement of submicron-size light-emitting diodes by triple dielectric layers

被引:9
作者
Cho, Hyunmin [1 ]
Kim, Daehyun [1 ]
Lee, Seunga [1 ]
Yoo, Chuljong [1 ]
Sim, Youngchul [1 ]
机构
[1] Samsung Display Co Ltd, Yongin, South Korea
关键词
atomic layer deposition; GaN-based micro-LEDs; nanorod LEDs; sidewall passivation; size effect; triple dielectric layers; SURFACE;
D O I
10.1002/jsid.1220
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Micro-LED (light-emitting diode) is an emerging technology that produces superiorly bright, efficient, and high-resolution display. However, efficiency drop at small chip sizes is one of the major hurdles for cost-effectiveness and ultra-compact form factor. We demonstrate highly efficient submicron-scale nanorod LEDs (nLEDs) passivated by the triple dielectric layers. The diameter, length, and wavelength at a peak external quantum efficiency (EQE) of nLEDs are 580 nm, 5 mu m, and 460 nm, respectively. We report a peak EQE of 22.2 +/- 0.3% with HfO2-based triple dielectric layer. We also explore the relation of indium fluctuation in multi-quantum wells (MQWs) to sidewall effect of micro-LEDs. We show that higher indium contents in MQWs successfully reduce non-radiative recombination on sidewall of InGaN blue nLEDs.
引用
收藏
页码:289 / 297
页数:9
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