Anti-Reflective Coatings Produced via Atomic Layer Deposition for Hybrid Polymer 3D Micro-Optics

被引：9

作者：

Astrauskyte, Darija ^{[1
]}

Galvanauskas, Karolis ^{[2
]}

Gailevicius, Darius ^{[2
]}

Drazdys, Mantas ^{[1
]}

Malinauskas, Mangirdas ^{[2
]}

Grineviciute, Lina ^{[1
]}

机构：

[1] Ctr Phys Sci & Technol, Savanoriu Ave 231, LT-02300 Vilnius, Lithuania

[2] Vilnius Univ, Fac Phys, Laser Res Ctr, Sauletekio Ave 10, LT-10223 Vilnius, Lithuania

来源：

NANOMATERIALS | 2023年 / 13卷 / 16期

关键词：

atomic layer deposition; anti-reflective coating; micro-optics; SZ2080 (TM); multi-photon lithography; direct laser writing; GROWTH; STRESS;

D O I：

10.3390/nano13162281

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The increasing demand for optics quality requires the lowest optical power loss, which can occur from unwanted reflections. Laser direct writing (LDW) allows for the fabrication of complex structures, which is particularly advantageous in micro-optic applications. This research demonstrates the possibility of forming an anti-reflective coating on hybrid polymer micro-lenses fabricated by employing LDW without changing their geometry. Such coating deposited via atomic layer deposition (ALD) decreased the reflection from 3.3% to 0.1% at a wavelength of 633 nm for one surface of hybrid organic-inorganic SZ2080 (TM) material. This research validates the compatibility of ALD with LDW 3D multiphoton lithography synergistically, expanding its applications on optical grade sub-100 mu m scale micro-optics.

引用

页数：13

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