Guiding and lasing comparison of Nd:YAG waveguide lasers fabricated by femtosecond laser inscription at 515 and 1030 nm

被引：3

作者：

Gebremichael, Wendwesen ^{[1
,2
]}

Dorrer, Christophe ^{[2
]}

Qiao, Jie ^{[1
,2
]}

机构：

[1] Rochester Inst Technol, Chester F Carlson Ctr Imaging Sci, New York, NY 14623 USA

[2] Aktiwave LLC, 150 Lucius Gordon Dr, West Henrietta, NY 14586 USA

来源：

JOURNAL OF LASER APPLICATIONS | 2023年 / 35卷 / 03期

基金：

美国国家航空航天局;

关键词：

Nd:YAG waveguide lasers; femtosecond laser inscription; double-track; pulse wavelength; ultrafast laser modification; track morphologies; laser threshold; refractive index changes; propagation loss; slope efficiency; WRITTEN; GLASS;

D O I：

10.2351/7.0001155

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We report the comparative investigation of fabricating type-II waveguide lasers in Nd:Y(3)A(l5)O(12) (Nd:YAG) using femtosecond laser pulses at 515 and 1030 nm. We focus on the comparison in track morphologies, modification thresholds, and the overall efficiency of the ultrafast laser inscription (ULI) process in creating these waveguides. For both wavelengths, we demonstrated low propagation losses of 0.2 dB/cm. We achieved the lowest reported lasing threshold of 9 mW in a Nd:YAG waveguide laser. Superior performance was achieved with the 1030-nm ULI source, yielding a slope efficiency over 40% and achieving a lasing threshold at half the value observed for the 515-nm source.

引用

页数：7