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Study on low-frequency noise characteristics of hydrogen-terminated diamond FETs
被引:0
|作者:
Wang, Hongyue
[1
]
Simoen, Eddy
[2
,5
]
Ge, Lei
[3
]
Liu, Yuebo
[1
]
Liu, Chang
[1
]
Xu, Mingsheng
[3
]
Shi, Yijun
[1
]
Cai, Zongqi
[1
]
Peng, Yan
[3
]
Wang, Xiwei
[3
]
Wang, Jinwang
[4
]
机构:
[1] Minist Ind & Informat Technol, Res Inst Elect 5, Sci & Technol Reliabil Phys & Applicat Elect Compo, Guangzhou 510610, Peoples R China
[2] IMEC, B-3001 Leuven, Belgium
[3] Shandong Univ, Inst Novel Semicond Mat, State Key Lab Crystal Mat, Jinan 250100, Peoples R China
[4] Peking Univ, Sch Elect Engn & Comp Sci, Beijing, Peoples R China
[5] Univ Ghent, Solid State Phys Dept, Ghent, Belgium
基金:
中国国家自然科学基金;
关键词:
Hydrogen-terminated;
Diamond;
Low frequency noise;
FETs;
Traps;
GR noise;
TRANSISTORS;
ORIGIN;
D O I:
10.1016/j.diamond.2023.110204
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
In this work, the low frequency noise (LFN) characteristics of Hydrogen-terminated diamond FETs are investigated. Both generation-recombination (GR) noise and flicker noise (1/f noise) are found to contribute to the LFN spectrum. The characteristic frequency of f(01) = 0.1 Hz, f(02) = 30 Hz, f(03) = 300 Hz and corresponding effective trap density (N-eff) of the GR centers are obtained. By changing the LFN measurement temperature, a trap activation energy level (E-a) of 0.12 eV is extracted from an Arrhenius plot. The dominant mechanism of the 1/f noise for the H-terminated diamond FETs follows the correlated mobility fluctuations (CMF) model. By fitting the experimental data to the CMF model, the trap density and scattering coefficient of the carriers are extracted to be 6.4x10(20) eV(-1) cm(-3) and 4x10(5) V<middle dot>s/C. At last, the trap density of the H-terminated diamond FETs is compared with other state-of-the-art GaN and Si based devices. A moderate trap density was obtained without any interface optimization, suggesting that H-terminated diamond FETs could be a promising future technology for power electronics.
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