Double Gaussian Distribution of Inhomogeneous Barrier Height in (Ni-Au)/Al0.25Ga0.75N/GaN

被引:1
作者
Saadaoui, Salah [1 ,2 ]
Fathallah, Olfa [2 ]
Maaref, Hassen [2 ]
机构
[1] King Khalid Univ, Fac Sci & Arts, Mohail Asir Campus Males, Abha, Saudi Arabia
[2] Univ Monastir, Fac Sci Monastir, Lab Microoptoelectron & Nanostruct, Ave Environm, Monastir 5000, Tunisia
关键词
AlGaN/GaN structure; Barrier inhomogeneity; Gaussian distribution; Deep traps; SCHOTTKY DIODES; TEMPERATURE-DEPENDENCE; INTERSECTING BEHAVIOR; ELECTRON-TRANSPORT; LEAKAGE CURRENT; PARAMETERS; MECHANISM; SILICON; STATES;
D O I
10.1007/s13538-022-01240-2
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The forward current-voltage (Ig-Vg) properties of the (Ni-Au)/Al0.25Ga0.75N/GaN/SiC structure were examined in the temperature range of 50-320K. Temperature has considerable influence on the zero-bias barrier height (phi(B0)), series resistance (Rs),and ideality factor (n).Furthermore, the standard Richardson plots of ln(I-0/T-2) vs. 10(3)/T for this sample revealed two linear zones (50-230 K and 230-320 K). For Al0.25Ga0.75N, the Richardson constant (A*) values in the linear zones were less than the predicted value (34.2 Acm(-2)K(-2)).This phenomenon is linked to the Schottky barrier inhomogeneities by adopting a double Gaussian distribution (GD) of the barrier heights (BHs) at the (Ni-Au)/Al0.25Ga0.75N interface. We attempted to establish an indication of the double GD of BHs for this sample by plotting phi(B0) vs. q/2kT. As a result, the Ig-Vg temperature dependency was satisfactorily described using the thermionic emission hypothesis with a double GD of the BHs at the (Ni-Au)/Al0.25Ga0.75N interface. These findings indicate that the inhomogeneous distribution of the surface and/or interface states is linked to the lateral inhomogeneity of the Schottky BH which is attributed to the defect existence confirming prior findings using the capacitance deep-level transient spectroscopy method.
引用
收藏
页数:11
相关论文
共 45 条
[1]   Current conduction mechanism in Al/p-Si Schottky barrier diodes with native insulator layer at low temperatures [J].
Altindal, S. ;
Kanbur, H. ;
Yildiz, D. E. ;
Parlak, M. .
APPLIED SURFACE SCIENCE, 2007, 253 (11) :5056-5061
[2]   DEEP-LEVEL ANALYSIS OF N-TYPE GAAS1-XPX ALLOYS [J].
BENSALEM, MM ;
ZAIDI, MA ;
MAAREF, H ;
BOURGOIN, JC .
JOURNAL OF APPLIED PHYSICS, 1995, 78 (02) :1004-1007
[3]   STUDIES OF TUNNEL MOS DIODES .1. INTERFACE EFFECTS IN SILICON SCHOTTKY DIODES [J].
CARD, HC ;
RHODERICK, EH .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1971, 4 (10) :1589-+
[4]   Evidence for the double distribution of barrier heights in Pd2Si/n-Si Schottky diodes from I-V-T measurements [J].
Chand, S ;
Kumar, J .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1996, 11 (08) :1203-1208
[5]   30-GHz Low-Noise Performance of 100-nm-Gate-Recessed n-GaN/AlGaN/GaN HEMTs [J].
Chang, Chia-Ta ;
Hsu, Heng-Tung ;
Chang, Edward Yi ;
Kuo, Chien-I ;
Huang, Jui-Chien ;
Lu, Chung-Yu ;
Miyamoto, Yasuyuki .
IEEE ELECTRON DEVICE LETTERS, 2010, 31 (02) :105-107
[6]   EXTRACTION OF SCHOTTKY DIODE PARAMETERS FROM FORWARD CURRENT-VOLTAGE CHARACTERISTICS [J].
CHEUNG, SK ;
CHEUNG, NW .
APPLIED PHYSICS LETTERS, 1986, 49 (02) :85-87
[7]   SURFACE STATES AND BARRIER HEIGHT OF METAL-SEMICONDUCTOR SYSTEMS [J].
COWLEY, AM ;
SZE, SM .
JOURNAL OF APPLIED PHYSICS, 1965, 36 (10) :3212-&
[8]   On the intersecting behaviour of experimental forward bias current-voltage (I-V) characteristics of Al/SiO2/p-Si (MIS) Schottky diodes at low temperatures [J].
Dokme, Ilbilge ;
Altindal, Semsettin .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2006, 21 (08) :1053-1058
[9]   Field-dependent carrier trapping induced kink effect in AlGaN/GaN high electron mobility transistors [J].
Fu, Lihua ;
Lu, Hai ;
Chen, Dunjun ;
Zhang, Rong ;
Zheng, Youdou ;
Chen, Tangsheng ;
Wei, Ke ;
Liu, Xinyu .
APPLIED PHYSICS LETTERS, 2011, 98 (17)