Optical and microstructural properties of electrodeposited cuprous oxide

被引:0
作者
Jurecka, Stanislav [1 ]
Sahoo, Prangya P. [1 ]
Cendula, Peter [1 ]
机构
[1] Univ Zilina, Inst Aurel Stodola, Komenskeho 843, Liptovsky Mikulas 03101, Slovakia
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2024年 / 130卷 / 03期
关键词
Hydrogen; Water splitting; Cu2O; AFM; Raman scattering; Microstructure analysis; THIN-FILM; CU2O; PHOTOELECTRODES; CONDUCTIVITY; PERFORMANCE; MORPHOLOGY;
D O I
10.1007/s00339-024-07321-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The production of hydrogen fuel using photoelectrochemical water splitting method requires semiconductor materials with suitable energy gap, electrical and optical properties. Cuprous oxide is feasible candidate fulfilling many of these requirements to be the photocathode of such devices. In this study, we investigated optical and microstructural properties of cuprous oxide prepared under different temperatures. Microstructure properties were evaluated by statistical, fractal and Fourier methods. Roughness characteristics, Fourier transforms and multifractal characteristics provide consistent information connected with the distribution of surface objects created during sample fabrication. Our methodology is feasible to provide practical insights for the fabrication and monitoring of surface and optical properties of Cu2O and other semiconductor materials.
引用
收藏
页数:7
相关论文
共 50 条
  • [31] Optical Study of Cuprous Oxide and Ferric Oxide Based Materials for Applications in Low Cost Solar Cells
    Thi Cuc Than
    Bao Thoa Bui
    Benjamin Wegmuller
    Minh Hieu Nguyen
    Lam Huong Hoang Ngoc
    Van Diep Bui
    Quoc Hung Nguyen
    Chi Hieu Hoang
    Thuat Nguyen-Tran
    [J]. Journal of Electronic Materials, 2016, 45 : 2407 - 2414
  • [32] Effect of reduced graphene oxide on photocatalytic properties of electrodeposited ZnO
    Pruna, A.
    Cembrero, J.
    Pullini, D.
    Mocioiu, A. M.
    Busquets-Mataix, D.
    [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2017, 123 (12):
  • [33] Heat Treatment Effects on the Microstructural and Mechanical Properties of Electrodeposited Cu-Ni Coatings
    Benatmane, A.
    Dhiflaoui, H.
    Ewald, M.
    Benhayoune, H.
    EL Hdiy, A.
    [J]. JOURNAL OF MATERIALS ENGINEERING AND PERFORMANCE, 2024,
  • [34] Surface engineering of electrodeposited cuprous oxide (Cu2O) thin films: Effect on hydrophobicity and LP gas sensing
    Bandara, K. N. D.
    Jayathilaka, K. M. D. C.
    Dissanayake, D. P.
    Jayanetti, J. K. D. S.
    [J]. APPLIED SURFACE SCIENCE, 2021, 561
  • [35] Preparation and photoelectric properties of praseodymium-doped cuprous oxide thin films
    Zhao, Ying-jie
    Li, Yan
    Wu, Yong-bin
    Zhou, Wei
    Zhong, Fu-xin
    [J]. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2020, 31 (04) : 3092 - 3100
  • [36] Preparation and photoelectric properties of F-doped cuprous oxide thin films
    Wu, Yong-bin
    Li, Yan
    Zhao, Ying-jie
    Zhou, Wei
    Zhong, Fu-xin
    [J]. OPTICAL MATERIALS, 2021, 111
  • [37] Effects of annealing temperature on crystal structure and glucose sensing properties of cuprous oxide
    Akilarasan, Muthumariappan
    Kogularasu, Sakthivel
    Chen, Shen-Ming
    Chen, Tse-Wei
    Govindasamy, Mani
    Lou, Bih-Show
    [J]. SENSORS AND ACTUATORS B-CHEMICAL, 2018, 266 : 655 - 663
  • [38] Study on the effect of annealing on the electrical properties of n-type cuprous oxide
    Xi, Z.
    Zeng, H.
    Liao, N.
    Shi, L.
    Huang, H.
    Guo, S.
    Wang, N.
    Jin, D.
    Wang, L.
    [J]. THIN SOLID FILMS, 2012, 520 (07) : 2708 - 2710
  • [39] Synthesis, microstructural, optical and mechanical properties of yttria stabilized zirconia thin films
    Amezaga-Madrid, P.
    Hurtado-Macias, A.
    Antunez-Flores, W.
    Estrada-Ortiz, F.
    Piza-Ruiz, P.
    Miki-Yoshida, M.
    [J]. JOURNAL OF ALLOYS AND COMPOUNDS, 2012, 536 : S412 - S417
  • [40] Electrical properties of microstructural thin film oxide phosphors
    Bondar, V
    [J]. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2000, 69 : 510 - 513