Low TCL, High-Q Inductors in Standard CMOS

被引：0
|
作者：
Hoen, Thomas J. [1 ]
Jin, Yanyu [2 ]
Annema, Anne-Johan [1 ]
Wils, Nicole [2 ]
Verlinden, Jos [2 ]
Nauta, Bram [1 ]
机构：
[1] Univ Twente, IC Design Grp, EEMCS, NL-7500 AE Enschede, Netherlands
[2] NXP Semicond, NL-5656 AE Eindhoven, Netherlands
来源：
IEEE MICROWAVE AND WIRELESS TECHNOLOGY LETTERS | 2024年 / 34卷 / 02期
关键词：
CMOS; eddy currents; inductance temperature coefficient; inductors; integrated; multipath; proximity effect; quality factor; skin effect; tapered; tapered multipath; CHIP SPIRAL INDUCTORS; DESIGN;
D O I：
10.1109/LMWT.2023.3338538
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Inductors with both a high quality factor Q(L) and a low temperature coefficient of inductance TCL are crucial for highly stable, fully integrated frequency references. We present tapered multipath inductors in a standard CMOS technology that achieve Q(L) > 8 and TCL = 1 ppm/C-degrees in aluminum-based (Al) top metal and reach Q(L) > 19 with a TCL = 30 ppm/C-degrees in a thick copper-based (Cu) metal layer, both at 2 GHz.
引用
收藏
页码：179 / 182
页数：4
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