Zeta potential variations in bonding states of fluorocarbon films deposited by plasma-enhanced chemical vapor deposition

被引：0

作者：

Takeya, Toru ^{[1
]}

Han, Huanwen ^{[2
]}

Yamashita, Ichiro ^{[2
]}

Okada, Takeru ^{[1
]}

机构：

[1] Tohoku Univ, Grad Sch Engn, Sendai 9808579, Japan

[2] Osaka Univ, Grad Sch Engn, Suita 5650871, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2023年 / 62卷 / SL期

关键词：

zeta potential; fluorocarbon; plasma; chemical vapor deposition; FLOW-INDUCED ELECTRICITY; POWER GENERATION; THIN-FILMS; WATER; LIQUID; ENERGY; GRAPHENE; POLYMER; ELECTRIFICATION; DROPLET;

D O I：

10.35848/1347-4065/accde7

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The interactions between a solid and a liquid at their interface often produce exotic effects that could be used in energy-related applications. To this end, understanding which properties control the zeta potentials at the interface promises to advance the application of these effects. In this study, we fabricated fluorocarbon films by plasma-enhanced CVD to investigate the interaction of the film with an aqueous solution. We found that the properties of the films can be controlled by the deposition pressure, and the zeta potential correlates with the bonding states within the films. The control of the interfacial potential between the solid material and the aqueous solution can be a factor in maximizing energy output and optimizing device design.

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页数：4

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