Emerging SiC Applications beyond Power Electronic Devices

被引:48
作者
La Via, Francesco [1 ]
Alquier, Daniel [2 ]
Giannazzo, Filippo [1 ]
Kimoto, Tsunenobu [3 ]
Neudeck, Philip [4 ]
Ou, Haiyan [5 ]
Roncaglia, Alberto [6 ]
Saddow, Stephen E. E. [7 ]
Tudisco, Salvatore [8 ]
机构
[1] CNR IMM, Strada 8 5, I-95121 Catania, Italy
[2] Univ Tours, GREMAN, UMR 7347, CNRS, F-37071 Tours, France
[3] Kyoto Univ, Dept Elect Sci & Engn, Nishikyo, Kyoto 6158510, Japan
[4] NASA Glenn Res Ctr, 21000 Brookpark Rd, Cleveland, OH 44135 USA
[5] Tech Univ Denmark, Dept Elect & Photon Engn, Bldg 343, DK-2800 Lyngby, Denmark
[6] CNR IMM, I-40129 Bologna, Italy
[7] Univ S Florida, Elect Engn Dept, 4202 E Fowler Ave, ENG 030, Tampa, FL 33620 USA
[8] Ist Nazl Fis Nucl, LNS, Via St Sofia 62, I-95124 Catania, Italy
基金
日本学术振兴会; 欧盟地平线“2020”;
关键词
silicon carbide; high temperature devices; detectors; photonics; MEMS; biomedical devices; POLYCRYSTALLINE 3C-SIC FILMS; FIELD-EFFECT TRANSISTORS; SILICON-CARBIDE; RESIDUAL-STRESS; MECHANICAL-PROPERTIES; RESISTANCE STANDARD; OPTICAL-PROPERTIES; THRESHOLD-VOLTAGE; ION-IMPLANTATION; EPITAXIAL-GROWTH;
D O I
10.3390/mi14061200
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
In recent years, several new applications of SiC (both 4H and 3C polytypes) have been proposed in different papers. In this review, several of these emerging applications have been reported to show the development status, the main problems to be solved and the outlooks for these new devices. The use of SiC for high temperature applications in space, high temperature CMOS, high radiation hard detectors, new optical devices, high frequency MEMS, new devices with integrated 2D materials and biosensors have been extensively reviewed in this paper. The development of these new applications, at least for the 4H-SiC ones, has been favored by the strong improvement in SiC technology and in the material quality and price, due to the increasing market for power devices. However, at the same time, these new applications need the development of new processes and the improvement of material properties (high temperature packages, channel mobility and threshold voltage instability improvement, thick epitaxial layers, low defects, long carrier lifetime, low epitaxial doping). Instead, in the case of 3C-SiC applications, several new projects have developed material processes to obtain more performing MEMS, photonics and biomedical devices. Despite the good performance of these devices and the potential market, the further development of the material and of the specific processes and the lack of several SiC foundries for these applications are limiting further development in these fields.
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页数:37
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