Microstructure and Mechanical Properties of Magnetron Sputtering TiN-Ni Nanocrystalline Composite Films

In this paper, TiN-Ni nanostructured composite films with different Ni contents are prepared using the magnetron sputtering method. The composition, microstructure, and mechanical properties of composite films are analyzed using an X-ray energy spectrometer (EDS), a scanning electron microscope (SEM), X-ray diffraction technology (XRD), a transmission electron microscope (TEM), and nanoindentation. All the films grow in a columnar crystal structure. There are only TiN diffraction peaks in the XRD spectrum, and no diffraction peaks of Ni and its compounds are observed. The addition of the Ni element disrupts the integrity of TiN lattice growth, resulting in a decrease in the grain size from 60 nm in TiN to 25 nm at 20.6% Ni. The film with a Ni content of 12.4 at.% forms a nanocomposite structure in which the nanocrystalline TiN phase (nc-TiN) is surrounded by the amorphous Ni (a-Ni) phase. The formation of nc-TiN/a-Ni nanocomposite structures relies on the good wettability of Ni on TiN ceramics. The hardness and elastic modulus of the film gradually decrease with the increase in Ni content, but the toughness is improved. The hardness and elastic modulus decrease from 19.9 GPa and 239.5 GPa for TiN film to 15.4 GPa and 223 GPa at 20.6 at.% Ni film, respectively, while the fracture toughness increases from 1.5 MPa center dot m1/2 to 2.0 MPa center dot m1/2. The soft and ductile Ni phase enriched at the TiN grain boundaries hinders the propagation of cracks in the TiN phase, resulting in a significant increase in the film's toughness. The research results of this paper provide support for the design of TiN-Ni films with high strength and toughness and the understanding of the formation mechanism of nanocomposite structures.