Multi-Geometry Parameters Optimization of Large-Area Roll-to-Roll Nanoimprint Module Using Grey Relational Analysis and Artificial Neural Network
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Nguyen, Truong Sinh
[1
,2
]
Gafurov, Anton Nailevich
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Korea Inst Machinery & Mat, Nanoconvergence Mfg Syst Res Div, Daejeon 34103, South Korea
Univ Sci & Technol, Dept Nanomechatron, Daejeon 34113, South KoreaKorea Inst Machinery & Mat, Nanoconvergence Mfg Syst Res Div, Daejeon 34103, South Korea
Gafurov, Anton Nailevich
[1
,3
]
Jo, Jeongdai
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Korea Inst Machinery & Mat, Nanoconvergence Mfg Syst Res Div, Daejeon 34103, South KoreaKorea Inst Machinery & Mat, Nanoconvergence Mfg Syst Res Div, Daejeon 34103, South Korea
Jo, Jeongdai
[1
]
Lee, Taik-Min
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Korea Inst Machinery & Mat, Nanoconvergence Mfg Syst Res Div, Daejeon 34103, South KoreaKorea Inst Machinery & Mat, Nanoconvergence Mfg Syst Res Div, Daejeon 34103, South Korea
Lee, Taik-Min
[1
]
Lee, Seung-Hyun
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Korea Inst Machinery & Mat, Nanoconvergence Mfg Syst Res Div, Daejeon 34103, South KoreaKorea Inst Machinery & Mat, Nanoconvergence Mfg Syst Res Div, Daejeon 34103, South Korea
Lee, Seung-Hyun
[1
]
Kim, Kyunghoon
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Sungkyunkwan Univ, Sch Mech Engn, Suwon 16419, South KoreaKorea Inst Machinery & Mat, Nanoconvergence Mfg Syst Res Div, Daejeon 34103, South Korea
Kim, Kyunghoon
[2
]
机构:
[1] Korea Inst Machinery & Mat, Nanoconvergence Mfg Syst Res Div, Daejeon 34103, South Korea
[2] Sungkyunkwan Univ, Sch Mech Engn, Suwon 16419, South Korea
[3] Univ Sci & Technol, Dept Nanomechatron, Daejeon 34113, South Korea
nanoimprint lithography;
roll to roll;
force distribution;
nip pressure;
uniformity;
grey relational analysis;
artificial neural network;
RESIDUAL LAYER THICKNESS;
PRESSURE DISTRIBUTION;
CALENDERING PROCESS;
LITHOGRAPHY;
FABRICATION;
ELECTRODES;
D O I:
10.3390/polym15132909
中图分类号:
O63 [高分子化学(高聚物)];
学科分类号:
070305 ;
080501 ;
081704 ;
摘要:
Micro- and nanofabrication on polymer substrate is integral to the development of flexible electronic devices, including touch screens, transparent conductive electrodes, organic photovoltaics, batteries, and wearable devices. The demand for flexible and wearable devices has spurred interest in large-area, high-throughput production methods. Roll-to-roll (R2R) nanoimprint lithography (NIL) is a promising technique for producing nano-scale patterns rapidly and continuously. However, bending in a large-scale R2R system can result in non-uniform force distribution during the imprinting process, which reduces pattern quality. This study investigates the effects of R2R imprinting module geometry parameters on force distribution via simulation, using grey relational analysis to identify optimal parameter levels and ANOVA to determine the percentage of each parameter contribution. The study also investigates the length and force ratio on a backup roller used for bending compensation. The simulation results and the artificial neural network (ANN) model enable the prediction of nip pressure and force distribution non-uniformity along the roller, allowing the selection of the optimal roller geometry and force ratio for minimal non-uniformity on a specific R2R system. An experiment was conducted to validate the simulation results and ANN model.
机构:
Micro Machining Research Centre, Department of Mechanical Engineering, Sree Vidyanikethan Engineering College (Autonomous), Tirupati, Andhra PradeshMicro Machining Research Centre, Department of Mechanical Engineering, Sree Vidyanikethan Engineering College (Autonomous), Tirupati, Andhra Pradesh
Manikandan N.
Raju R.
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Department of Mechanical Engineering, Santhiram Engineering College, Nandyal, Kurnool, Andhra PradeshMicro Machining Research Centre, Department of Mechanical Engineering, Sree Vidyanikethan Engineering College (Autonomous), Tirupati, Andhra Pradesh
Raju R.
Palanisamy D.
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Dr. Abdul Kalam Research Centre, Department of Mechanical Engineering, Adhi College of Engineering and Technology, Chennai, 631605, Tamil NaduMicro Machining Research Centre, Department of Mechanical Engineering, Sree Vidyanikethan Engineering College (Autonomous), Tirupati, Andhra Pradesh
Palanisamy D.
Binoj J.S.
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Micro Machining Research Centre, Department of Mechanical Engineering, Sree Vidyanikethan Engineering College (Autonomous), Tirupati, Andhra PradeshMicro Machining Research Centre, Department of Mechanical Engineering, Sree Vidyanikethan Engineering College (Autonomous), Tirupati, Andhra Pradesh
机构:
Saveetha Inst Med & Tech Sci, Saveetha Sch Engn, Chennai 602105, Tamil Nadu, IndiaSaveetha Inst Med & Tech Sci, Saveetha Sch Engn, Chennai 602105, Tamil Nadu, India
Sabari, K.
Muniappan, A.
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Saveetha Inst Med & Tech Sci, Saveetha Sch Engn, Chennai 602105, Tamil Nadu, IndiaSaveetha Inst Med & Tech Sci, Saveetha Sch Engn, Chennai 602105, Tamil Nadu, India
Muniappan, A.
Deepanraj, B.
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机构:
Prince Mohammad Bin Fahd Univ, Coll Engn, Al Khobar 31952, Saudi ArabiaSaveetha Inst Med & Tech Sci, Saveetha Sch Engn, Chennai 602105, Tamil Nadu, India
Deepanraj, B.
Mohamed, M. jinnah sheik
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机构:
Nellai Coll Engn, Tirunelveli 627151, Tamil Nadu, IndiaSaveetha Inst Med & Tech Sci, Saveetha Sch Engn, Chennai 602105, Tamil Nadu, India