Thin - film Lithium Niobate Photonic Devices on 8-inch Silicon Substrates

被引：0

作者：

Wang, Hengyu ^{[1
]}

Xu, Yang ^{[1
]}

Li, Zhaoyi ^{[1
]}

Jia, Lianxi ^{[2
]}

Zhu, Shiyang ^{[3
]}

Wang, Yuxi ^{[3
]}

Yao, Zhanshi ^{[3
]}

Zheng, Shaonan ^{[1
]}

Zhong, Qize ^{[1
]}

Dong, Yuan ^{[1
]}

Hu, Ting ^{[1
]}

机构：

[1] Shanghai Univ, Sch Microelect, Shanghai, Peoples R China

[2] Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Shanghai, Peoples R China

[3] Huawei Technol, B&P Lab, Shenzhen, Peoples R China

来源：

2023 OPTICAL FIBER COMMUNICATIONS CONFERENCE AND EXHIBITION, OFC | 2023年

关键词：

D O I：

10.1364/OFC.2023.W2B.1

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Thin - film lithium niobate photonic devices are first demonstrated on 8 - inch silicon substrates. The fabrication is done in a commercial semiconductor foundry. A waveguide propagation loss of 0.47 0.09 dB/cm is achieved at 1550 nm wavelength. (c) 2022 The Author(s)

引用

页数：3

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