Optical Properties in Mid-Infrared Range of Silicon Oxide Thin Films with Different Stoichiometries

被引：16

作者：

Herguedas, Natalia ^{[1
]}

Carretero, Enrique ^{[1
]}

机构：

[1] Univ Zaragoza, Dept Fis Aplicada, C Pedro Cerbuna 12, Zaragoza 50009, Spain

来源：

NANOMATERIALS | 2023年 / 13卷 / 20期

关键词：

thin film; optical properties; mid-infrared; silicon oxide; refractive index; PERFECT ANTIREFLECTION COATINGS; DIELECTRIC FUNCTION; ZINC-OXIDE; MAGNETRON; DEPOSITION; SPECTROSCOPY; NITRIDE; DIOXIDE; MODEL; SIOX;

D O I：

10.3390/nano13202749

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

SiOx thin films were prepared using magnetron sputtering with different O2 flow rates on a silicon substrate. The samples were characterized using Fourier transform infrared spectroscopy in transmission and reflection, covering a spectral range of 5 to 25 mu m. By employing a multilayer model, the values of the complex refractive index that best fit the experimental transmission and reflection results were optimized using the Brendel-Bormann oscillator model. The results demonstrate the significance of selecting an appropriate range of O2 flow rates to modify the SiOx stoichiometry, as well as how the refractive index values can be altered between those of Si and SiO2 in the mid-infrared range.

引用

页数：12

共 46 条

[1] Sputtered tin silicon oxide films for durable solar control coatings [J].

Ando, E ;

Suzuki, S ;

Shimizu, J ;

Hayashi, Y .

THIN SOLID FILMS, 1999, 351 (1-2) :301-307

[2] Optical, structural and composition properties of silicon nitride films deposited by reactive radio-frequency sputtering, low pressure and plasma-enhanced chemical vapor deposition [J].

Beliaev, Leonid Yu. ;

Shkondin, Evgeniy ;

Lavrinenko, Andrei V. ;

Takayama, Osamu .

THIN SOLID FILMS, 2022, 763

[3]

Berning P. H., 1963, Physics of Thin Films

[4] AN INFRARED DIELECTRIC FUNCTION MODEL FOR AMORPHOUS SOLIDS [J].

BRENDEL, R ;

BORMANN, D .

JOURNAL OF APPLIED PHYSICS, 1992, 71 (01) :1-6

[5] Multilayer passive radiative selective cooling coating based on Al/SiO2/SiNx/SiO2/TiO2/SiO2 prepared by dc magnetron sputtering [J].

Cunha, N. F. ;

AL-Rjoub, A. ;

Rebouta, L. ;

Vieira, L. G. ;

Lanceros-Mendez, S. .

THIN SOLID FILMS, 2020, 694

[6] Toward perfect antireflection coatings. 3. Experimental results obtained with the use of Reststrahlen materials [J].

Dobrowolski, JA ;

Guo, YN ;

Tiwald, T ;

Ma, PH ;

Poitras, D .

APPLIED OPTICS, 2006, 45 (07) :1555-1562

[7] Toward perfect antireflection coatings: numerical investigation [J].

Dobrowolski, JA ;

Poitras, D ;

Ma, P ;

Vakil, H ;

Acree, M .

APPLIED OPTICS, 2002, 41 (16) :3075-3083

[8] Analysis of sub-stoichiometric hydrogenated silicon oxide films for surface passivation of crystalline silicon solar cells [J].

Einsele, Florian ;

Beyer, Wolfhard ;

Rau, Uwe .

JOURNAL OF APPLIED PHYSICS, 2012, 112 (05)

[9] Magnetron sputtering of transparent conductive zinc oxide: relation between the sputtering parameters and the electronic properties [J].

Ellmer, K .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2000, 33 (04) :R17-R32

[10] DIELECTRIC FUNCTION OF SPUTTER-DEPOSITED SILICON DIOXIDE AND SILICON-NITRIDE FILMS IN THE THERMAL INFRARED [J].

ERIKSSON, TS ;

JIANG, S ;

GRANQVIST, CG .

APPLIED OPTICS, 1985, 24 (06) :745-746

← 1 2 3 4 5 →