Development of an atmospheric fluorocarbon plasma jet generated by pulse modulated microwave discharge

被引:6
作者
Chen, Sile [1 ]
Ren, Xinliu [1 ]
Chen, Zhaoquan [1 ]
Xu, Xiaojuan [1 ]
Cheng, Tao [1 ]
LI, Ping [2 ]
Zhang, Guanjun [3 ]
Lu, Xinpei [4 ]
机构
[1] Anhui Univ Technol, Sch Elect & Informat Engn, Maanshan 243032, Peoples R China
[2] Anhui Univ Sci & Technol, Sch Elect & Informat Engn, Huainan 232001, Peoples R China
[3] Xi An Jiao Tong Univ, Sch Elect Engn, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Peoples R China
[4] Huazhong Univ Sci & Technol, State Key Lab Adv Electromagnet Engn & Technol, Wuhan 430074, Peoples R China
基金
中国国家自然科学基金;
关键词
microwave discharge; atmospheric pressure plasma jet; fluorocarbon plasma; CF4;
D O I
10.1088/2058-6272/acdb51
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Atmospheric fluorocarbon plasma plays an important role in the surface modification of insulating materials like polymers. The existing fluorocarbon plasma is usually generated by dielectric barrier discharge, which has a low concentration of reactive species and may cause insufficient surface fluorination. This work attempts to develop an atmospheric fluorocarbon plasma jet using a coaxial transmission line resonator by microwave discharge with locally enhanced electric field and high density. The gas temperature is reduced by pulse modulation technology. Three kinds of working gases, pure CF4, Ar/CF4 and He/CF4, are utilized to generate the atmospheric microwave fluorocarbon plasma jet. The discharge images, optical emission spectra, electron densities and gas temperatures are studied experimentally. The results show that the Ar/CF4 plasma jet has the best comprehensive performance, such as strong discharge intensity and controllable gas temperature. The electron density of the Ar/CF4 plasma jet has a magnitude of 10(20) m(-3), indicating a higher density than that of the frequently used dielectric barrier discharge. With the other conditions unchanged, the gas temperature at the end of the Ar/CF4 plasma jet can be reduced from 410.2 to 347.3 K by decreasing the duty cycle of the modulated pulse from 0.5 to 0.1. Thence, the microwave Ar/CF4 plasma jet is considered to be a promising fluorocarbon plasma source for surface fluorination of polymers.
引用
收藏
页数:10
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