Fabrication of high-rate microsupercapacitors by ultraviolet laser-assisted scribing of fluorinated graphene films

被引:5
作者
Sysoev, Vitalii I. [1 ]
V. Gorodetskiy, Dmitriy [1 ]
Popov, Konstantin M. [1 ]
Makarova, Anna A. [2 ]
Bulusheva, Lyubov G. [1 ]
V. Okotrub, Alexander [1 ]
机构
[1] Russian Acad Sci, Nikolaev Inst Inorgan Chem, Siberian Branch, 3 Acad,Lavrentiev Ave, Novosibirsk 630090, Russia
[2] Free Univ Berlin, Inst Chem & Biochem, Phys Chem, Arnimallee 22, D-14195 Berlin, Germany
关键词
Microsupercapactior; Laser patterning; Graphene; Fluorination; Impedance spectroscopy; Energy storage; X-RAY PHOTOEMISSION; MICRO-SUPERCAPACITORS; DOPED GRAPHENE; GRAPHITE OXIDE; CAPACITANCE; ABSORPTION; ELECTRODE; ENERGY;
D O I
10.1016/j.jpowsour.2022.232549
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The work presents the scalable fabrication of microsupercapacitors by scribing fluorinated graphene (FG) films using a low-power ultraviolet (UV) laser. The interaction of the FG film with UV light leads to its transformation to a few-layer graphene-like material with a tunable composition and structure. In the resulting graphene/FG hybrids, the patterned graphene sections act as electrodes, while the dielectric FG areas serve as a separator/ electrolyte storage. The electrochemical characteristics of the samples were studied by cyclic voltammetry, galvanostatic charge-discharge measurements and impedance spectroscopy. The best microsupercapacitors have an areal capacitance of 0.35 mF cm-2 at 0.02 V s- 1, a power density of 5580 mu W cm-2, and a capacity retention of 84% over the scan rate range of 0.01-1 V s- 1.
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页数:8
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