Robust dynamic spectroscopic imaging ellipsometer based on a monolithic polarizing Linnik interferometer

被引:4
作者
Hwang, Gukhyeon [1 ]
Choi, Inho [1 ]
Choi, Sukhyun [1 ]
Kheiryzadehkhanghah, Saeid [1 ]
Chegal, Won [2 ,3 ]
Kim, Sundtae [4 ]
Kim, Sangjun [1 ,4 ]
Magnusson, Robert [2 ,5 ]
Kim, Daesuk [1 ]
机构
[1] Jeonbuk Natl Univ, Div Mech Syst Engn, Jeonju 54896, South Korea
[2] Korea Res Inst Stand & Sci, Semicond Integrated Metrol Team, 267 Gajeong Ro, Daejeon 34113, South Korea
[3] Chungnam Natl Univ, Grad Sch Analyt Sci & Technol GRAST, Daejeon 34134, South Korea
[4] Auros Technol Inc, Hwaseong 18487, South Korea
[5] Univ Texas Arlington, Dept Elect Engn, Arlington, TX 76019 USA
基金
新加坡国家研究基金会;
关键词
THICKNESS; PHASE;
D O I
10.1364/OE.487111
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We describe a robust dynamic spectroscopic imaging ellipsometer (DSIE) based on a monolithic Linnik-type polarizing interferometer. The Linnik-type monolithic scheme combined with an additional compensation channel solves the long-term stability problem of previous single-channel DSIE. The importance of a global mapping phase error compensation method is also addressed for accurate 3-D cubic spectroscopic ellipsometric mapping in large-scale applications. To evaluate the effectiveness of the proposed compensation method for enhancing system robustness and reliability, a whole thin film wafer mapping is conducted in a general environment where various external disturbances affect the system.& COPY; 2023 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement
引用
收藏
页码:19569 / 19587
页数:19
相关论文
共 34 条
  • [1] [Anonymous], 1999, NEWPORT WHITE PAPER
  • [2] Imaging ellipsometry: quantitative analysis
    Asinovski, L.
    Beaglehole, D.
    Clarkson, M. T.
    [J]. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2008, 205 (04): : 764 - 771
  • [3] Through-focus scanning-optical-microscope imaging method for nanoscale dimensional analysis
    Attota, Ravikiran
    Germer, Thomas A.
    Silver, Richard M.
    [J]. OPTICS LETTERS, 2008, 33 (17) : 1990 - 1992
  • [4] A new spectral imaging ellipsometer for measuring the thickness of patterned thin films
    Chegal, W
    Cho, YJ
    Kim, HJ
    Cho, HM
    Lee, YW
    Kim, SH
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2004, 43 (9A): : 6475 - 6476
  • [5] Chipman RA, 2019, POLARIZED LIGHT AND OPTICAL SYSTEMS, P1
  • [6] Robustness enhancement of dynamic spectroscopic ellipsometry by compensating temperature dependency of the monolithic polarizing interferometer
    Choi, Inho
    Dembele, Vamara
    Kheiryzadehkhanghah, Saeid
    Hwang, Gukhyeon
    Charron, Benjamin
    Masson, Jean-Francois
    Kim, Daesuk
    [J]. APPLIED OPTICS, 2022, 61 (26) : 7653 - 7661
  • [7] Dynamic spectroscopic ellipsometry based on a one-piece polarizing interferometric scheme
    Dembele, Vamara
    Choi, Sukhyun
    Chegal, Won
    Choi, Inho
    Paul, Madhan Jayakumar
    Kim, Junho
    Kim, Daesuk
    [J]. OPTICS COMMUNICATIONS, 2020, 454
  • [8] Interferometric snapshot spectro-ellipsometry
    Dembele, Vamara
    Jin, Moonseob
    Choi, Inho
    Chegal, Won
    Kim, Daesuk
    [J]. OPTICS EXPRESS, 2018, 26 (02): : 1333 - 1341
  • [9] Fujiwara H., 2007, Spectroscopic Ellipsometry: Principles and Applications, DOI 10.1002/9780470060193
  • [10] Spectral interferometric technique to measure the ellipsometric phase of a thin-film structure
    Hlubina, Petr
    Ciprian, Dalibor
    Lunacek, Jiri
    [J]. OPTICS LETTERS, 2009, 34 (17) : 2661 - 2663