Numerical Investigation of Laterally Downscaled Hydrogen-Terminated Diamond FETs

被引:1
作者
Chen, Junfei [1 ,2 ]
Wu, Yong [1 ,2 ]
Zhang, Jinfeng [1 ,2 ]
Wang, Dong [1 ,2 ]
Ren, Zeyang [1 ,2 ]
Chen, Xing [2 ]
Lei, Yingyi [3 ]
Zhang, Jincheng [1 ]
Hao, Yue [1 ]
机构
[1] Xidian Univ, Sch Microelect, Key Lab Wide Band Gap Semicond Mat & Devices, Xian 710071, Peoples R China
[2] Xidian Wuhu Res Inst, Wuhu 241002, Peoples R China
[3] Xian Microelect Technol Inst, Xian 710054, Peoples R China
基金
中国国家自然科学基金;
关键词
Logic gates; Diamonds; MOSFET; Resistance; MODFETs; HEMTs; Transconductance; Diamond; down-scaling; short-channel effect; FREQUENCY; MOSFETS;
D O I
10.1109/TED.2022.3223643
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Hydrogen-terminated diamond (H-diamond) field-effect transistors (FETs) have been the mainstream structure of diamond microwave devices. In this article, the direct current performance and cutoff frequency (fT) of H-diamond FETs with the gate length (LG) downscal-ing from 2 mu m to 50 nm are investigated by 2-D device simulation. For our central-gated device with a 6-nm-thick Al2O3 gate dielectric, the transition point of LG from the long-channel behavior to the short-channel one is found to be about 200 nm. Though notable short-channel effects appear for LG <= 200 nm such as the negative shift of the threshold voltage and the increase of the drain-induced barrier lowering, the knee voltage at a given gate voltage stays almost constant for all the considered gate length range, which is unfavorable for a small-size device with lower operating voltage. It is found the effective velocity in the channel of short-channel H-diamond FETs at the drain voltage of 7 V is less than half of the saturation velocity. The fT versus VGS relation is quite different in the short channel case and long channel case, and it is analyzed in comparison with the gm versus VGS relation. lent their saturation and [2], activation the two-dimensional est (H-diamond) tors microwave achieved a tance [8], at
引用
收藏
页码:20 / 24
页数:5
相关论文
共 50 条
  • [31] Achieving ultrahigh hole mobility in hydrogen-terminated diamond via boron nitride modifications
    Yang, Mingyang
    Hu, Youwang
    Cui, Junfeng
    Yang, Yingying
    Qiu, Mengting
    Lu, Yunxiang
    Shen, Yi
    Jia, Zhenglin
    Nishimura, Kazuhito
    Tang, Chun
    Jiang, Nan
    Yuan, Qilong
    DIAMOND AND RELATED MATERIALS, 2024, 144
  • [32] Metal-semiconductor field-effect transistors on hydrogen-terminated diamond surfaces
    Tsugawa, K
    Kitatani, K
    Kawarada, H
    DIAMOND FILMS AND TECHNOLOGY, 1998, 8 (04): : 289 - 297
  • [33] Characterization of Current Collapse and Enhancement of Hydrogen-Terminated Diamond MOSFET Due to Long-Term Trapping Effects
    Jia, Yonghao
    Xu, Yuehang
    Yu, Xinxin
    Chen, Zhihao
    Fu, Yu
    Zhou, Jianjun
    Kong, Yuechan
    Chen, Tangsheng
    Lu, Wei-Bing
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2024, 71 (02) : 971 - 975
  • [34] Low-Temperature Transport Properties of Holes Introduced by Ionic Liquid Gating in Hydrogen-Terminated Diamond Surfaces
    Yamaguchi, Takahide
    Watanabe, Eiichiro
    Osato, Hirotaka
    Tsuya, Daiju
    Deguchi, Keita
    Watanabe, Tohru
    Takeya, Hiroyuki
    Takano, Yoshihiko
    Kurihara, Shinichiro
    Kawarada, Hiroshi
    JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 2013, 82 (07)
  • [35] Characteristics of hydrogen-terminated single crystalline diamond field effect transistors with different surface orientations
    Zhang Jin-Feng
    Xu Jia-Min
    Ren Ze-Yang
    He Qi
    Xu Sheng-Rui
    Zhang Chun-Fu
    Zhang Jin-Cheng
    Hao Yue
    ACTA PHYSICA SINICA, 2020, 69 (02)
  • [36] Surface transfer doping of hydrogen-terminated diamond probed by shallow nitrogen-vacancy centers
    Kageura, Taisuke
    Sasama, Yosuke
    Yamada, Keisuke
    Kimura, Kosuke
    Onoda, Shinobu
    Takahide, Yamaguchi
    CARBON, 2024, 229
  • [37] Nanofabrication on hydrogen-terminated diamond surfaces by atomic force microscope probe-induced oxidation
    Tachiki, M
    Fukuda, T
    Sugata, K
    Seo, H
    Umezawa, H
    Kawarada, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (7B): : 4631 - 4632
  • [38] Prediction of highly scaled hydrogen-terminated diamond MISFET performance based on calibrated TCAD simulation
    Wong, Hiu Yung
    Braga, Nelson
    Mickevicius, R. V.
    DIAMOND AND RELATED MATERIALS, 2017, 80 : 14 - 17
  • [39] Performance of hydrogen-terminated diamond MOSFET with LaB6/Al2O3 bilayer dielectric
    He, Shi
    Wang, Yan-Feng
    Chen, Genqiang
    Zhang, Minghui
    Wang, Wei
    Chang, Xiaohui
    Li, Qi
    Zhang, Qianwen
    Zhu, Tianfei
    Wang, Hong-Xing
    DIAMOND AND RELATED MATERIALS, 2021, 120
  • [40] Irradiation effects of X-rays up to 3 MGy on hydrogen-terminated diamond MOSFETs
    Masumura, Tadashi
    Umezawa, Hitoshi
    Yamaguchi, Takahiro
    Deguchi, Yusei
    Kawashima, Hiroyuki
    Makino, Toshiharu
    Hoshikawa, Naohisa
    Koizumi, Hitoshi
    Kaneko, Junichi H.
    DIAMOND AND RELATED MATERIALS, 2023, 135