Defect and doping engineered Ga2XY as electrocatalyst for hydrogen evolution reaction: First principles study

被引:7
|
作者
Gao, Jingming [1 ,2 ]
Jia, Baonan [1 ,3 ]
Zhao, Jiaxiang [1 ]
Wei, Feng [1 ]
Hao, Jinbo [4 ]
Lou, Wenhua [1 ]
Guan, Xiaoning [1 ]
Chen, Wei [5 ]
Lu, Pengfei [1 ,2 ]
机构
[1] Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China
[2] Beijing Univ Posts & Telecommun, Sch Integrated Circuits, Beijing 100876, Peoples R China
[3] Univ Sci & Technol Beijing, Sch Automat & Elect Engn, Key Lab Knowledge Automat Ind Proc, Minist Educ, Beijing, Peoples R China
[4] Xian Univ Architecture & Technol, Sch Sci, Xian 710055, Peoples R China
[5] Yuncheng Vocat & Tech Univ, Sch Informat Technol Applicat Innovat, Yuncheng 044000, Shanxi, Peoples R China
关键词
Ga 2 XY system; Defect engineer; Doping engineer; Electrocatalyst; First principles; BASAL-PLANE; TRANSITION; DICHALCOGENIDES; MONOLAYER; POLLUTION; DESIGN;
D O I
10.1016/j.ijhydene.2024.01.327
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Recently, chalcogenides have attracted much attention as electrocatalysts in hydrogen evolution reaction (HER). However, few studies have been conducted on the electrocatalytic properties of gallium oxides and chalcogenides. In this paper, a Ga2XY (X =/ Y, X, Y=O, S, Se, Te) defect structure doped by non-metal B, C, N, P, Si, and As have been designed. According to the study, the doping of non-metal atoms can significantly enhance their HER properties, the Ga2OSe-AsXi-Xi structure and Ga2SeTe-SiXi-NM structure possess intensely excellent HER properties in this study with the Gibbs free energy of 0.01 eV and 0.00 eV, respectively. It is found that the Ga2SeTe structure has a more concentrated electron transfer range compared to the Ga2OSe structure, leading to a superior HER performance. This work provides a new idea for the study of HER electrocatalytic performance of the Ga2XY system, and it is expected to be applied to HER catalysts affordably and efficiently.
引用
收藏
页码:1396 / 1405
页数:10
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