Two decades of two-photon lithography: Materials science perspective for additive manufacturing of 2D/3D nano-microstructures

被引:45
作者
Jaiswal, Arun [1 ]
Rastogi, Chandresh Kumar [2 ]
Rani, Sweta [3 ]
Singh, Gaurav Pratap [1 ]
Saxena, Sumit [1 ,3 ]
Shukla, Shobha [1 ,3 ,4 ]
机构
[1] Indian Inst Technol, Dept Met Engn & Mat Sci, Nanostruct Engn & Modeling Lab, Mumbai 400076, India
[2] Ctr Adv Studies, Lucknow 226031, India
[3] Monash Res Acad, Indian Inst Technol Bombay, Dept Met Engn & Mat Sci, Nanostruct Engn & Modeling Lab, Mumbai 400076, India
[4] Indian Inst Technol, Water Innovat Ctr Technol Res & Educ, Dept Met Engn & Mat Sci, Mumbai 400076, Maharashtra, India
关键词
UV PHOTOINITIATOR; ELECTRON-TRANSFER; CROSS-SECTION; POLYMERIZATION; FABRICATION; MICROFABRICATION; RESOLUTION; HYDROGEL; NANOSTRUCTURES; GENERATION;
D O I
10.1016/j.isci.2023.106374
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Two-photon lithography (TPL) is a versatile technology for additive manufacturing of 2D and 3D micro/nanostructures with sub-wavelength resolved features. Recent advancement in laser technology has enabled the application of TPL fabricated structures in several fields such as microelectronics, photonics, optoelectronics, microfluidics, and plasmonic devices. However, the lack of two-photon polymerizable resins (TPPRs) induces bottleneck to the growth of TPL to its true potential, and hence continuous research efforts are focused on developing efficient TPPRs. In this article, we review the recent advancements in PI and TPPR formulation and the impact of process parameters on fabrication of 2D and 3D structures for specific applications. The fundamentals of TPL are described, followed by techniques used for achieving improved resolution and functional micro/nanostructures. Finally, a critical outlook and future prospects of TPPR formulation for specific applications are presented.
引用
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页数:30
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