Luminescence Properties of the Hexagonal Boron Nitride Epilayer

被引:6
作者
Wang, Gaokai [1 ,2 ]
Cheng, Yong [1 ,2 ]
Chen, Jingren [1 ,2 ]
Meng, Junhua [3 ]
Zeng, Libin [1 ,2 ]
Yin, Zhigang [1 ,2 ]
Wu, Jinliang [1 ,2 ]
Zhang, Xingwang [1 ,2 ,4 ]
机构
[1] Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
[2] Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
[3] Beijing Univ Technol, Fac Sci, Beijing 100124, Peoples R China
[4] Wuyi Univ, Joint Lab Digital Opt Chip, Jiangmen 529020, Peoples R China
基金
中国国家自然科学基金;
关键词
cathodoluminescence; deep ultraviolet; defects luminescence; electronic band structures; hexagonal boron nitride; TEMPERATURE;
D O I
10.1002/adom.202301034
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
As an emerging 2D ultrawide bandgap semiconductor, hexagonal boron nitride (h-BN) is gaining significant attention for its superior properties and wide applications. Although optical properties of h-BN have been partially revealed by using h-BN bulk single crystal, luminescence properties of the h-BN few-layer are rare due to its poor crystallinity. In this work, the h-BN epilayers have been synthesized on sapphire substrates by the submicron-spacing vapor deposition method. The crystalline quality of the h-BN epilayer is improved with the increase of the growth temperature, and the full width at half-maximum of the Raman peak is only & AP;13 cm(-1). The low temperature cathodoluminescence spectra of h-BN epilayers exhibit two strong deep ultraviolet (DUV) luminescence peaks at 5.49 and 5.35 eV, as well as a weaker and broader defect-related emission band at & AP;4.0 eV. The DUV emission band is ascribed to the recombination of bound excitons and its phonon replica. Based on the theoretically predicted energy levels, the 4.0 eV emission band is tentatively attributed to the radiative transition from C impurities occupying the B sites to the B vacancies. Moreover, the h-BN-based DUV photodetectors exhibit an outstanding performance, making it a promising prospect for optoelectronic applications.
引用
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页数:8
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