Extraction Technique for the Conduction Band Minimum Energy in Amorphous Indium-Gallium-Zinc-Oxide Thin Film Transistors

被引:4
作者
Kim, Haesung [1 ]
Yoo, Han Bin [1 ]
Lee, Heesung [2 ]
Ryu, Ji Hee [1 ]
Park, Ju Young [1 ]
Han, Seung Hyeop [1 ]
Yang, Hyojin [1 ]
Bae, Jong-Ho [1 ]
Choi, Sung-Jin [1 ]
Kim, Dae Hwan [1 ]
Kim, Dong Myong [1 ]
机构
[1] Kookmin Univ, Sch Elect Engn, Seoul 02707, South Korea
[2] SEC, Memory Business, DRAM PA Team, DRAM Prod & Technol, Pyeongtaek 17786, Gyeonggi, South Korea
基金
新加坡国家研究基金会;
关键词
Thin film transistors; Logic gates; Optimized production technology; Threshold voltage; Substrates; Random access memory; Indium; Amorphous oxide semiconductor-based thin film transistors (AOS TFTS); amorphous indium-gallium-zinc-oxide (a-IGZO)-TFTS; conduction band minimum energy; extraction technique; mobility edge; SUBGAP DOS; CAPACITANCE; STATES;
D O I
10.1109/TED.2023.3269735
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The conduction band minimum energy in amorphous oxide semiconductor-based thin film transistors (AOS TFTs) is a key parameter governing the accurate extraction of energy distribution for the subgap density-of states (DOSs) and carrier mobility. We report a technique for extraction of the gate voltage (V-CBM) and corresponding energy (E-F,E-CBM = EC-EREF) for the quasi-Fermi level (E-F) equal to the conduction band minimum (E-C) as V-CBM = V-GS (E-F = E-C) and E-F,E-CBM = E-F (V-GS = V-CBM). In order to confirm this technique through optoelectronic experimental data, amorphous indium-gallium-zinc-oxide (a-IGZO)based thin film transistor was irradiated with various wavelengths and power, and obtained V-CBM = 7.1 V and E-F CBM = 71 meV in the dark state. This technique is expected to be useful in the accurate characterization of the subgap DOS and the effective mobility in AOS TFTs through a simple and effective extraction process.
引用
收藏
页码:3126 / 3130
页数:5
相关论文
共 22 条
[1]   Oxide-TFT technologies for next-generation AMOLED displays [J].
Arai, Toshiaki .
JOURNAL OF THE SOCIETY FOR INFORMATION DISPLAY, 2012, 20 (03) :156-161
[2]  
Arora N., 2007, MOSFET Modeling for VLSI Simulation: Theory and Practice
[3]   Fully Current-Based Sub-Bandgap Optoelectronic Differential Ideality Factor Technique and Extraction of Subgap DOS in Amorphous Semiconductor TFTs [J].
Bae, Hagyoul ;
Seo, Hyojoon ;
Jun, Sungwoo ;
Choi, Hyunjun ;
Ahn, Jaeyeop ;
Hwang, Junseok ;
Lee, Jungmin ;
Oh, Saeroonter ;
Bae, Jong-Uk ;
Choi, Sung-Jin ;
Kim, Dae Hwan ;
Kim, Dong Myong .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2014, 61 (10) :3566-3569
[4]   Single-Scan Monochromatic Photonic Capacitance-Voltage Technique for Extraction of Subgap DOS Over the Bandgap in Amorphous Semiconductor TFTs [J].
Bae, Hagyoul ;
Choi, Hyunjun ;
Jun, Sungwoo ;
Jo, Chunhyung ;
Kim, Yun Hyeok ;
Hwang, Jun Seok ;
Ahn, Jaeyeop ;
Oh, Saeroonter ;
Bae, Jong-Uk ;
Choi, Sung-Jin ;
Kim, Dae Hwan ;
Kim, Dong Myong .
IEEE ELECTRON DEVICE LETTERS, 2013, 34 (12) :1524-1526
[5]   Extraction Technique for Intrinsic Subgap DOS in a-IGZO TFTs by De-Embedding the Parasitic Capacitance Through the Photonic C-V Measurement [J].
Bae, Hagyoul ;
Choi, Hyunjun ;
Oh, Saeroonter ;
Kim, Dae Hwan ;
Bae, Jonguk ;
Kim, Jaehyeong ;
Kim, Yun Hyeok ;
Kim, Dong Myong .
IEEE ELECTRON DEVICE LETTERS, 2013, 34 (01) :57-59
[6]   Differential Ideality Factor Technique for Extraction of Subgap Density of States in Amorphous InGaZnO Thin-Film Transistors [J].
Bae, Minkyung ;
Yun, Daeyoun ;
Kim, Yongsik ;
Kong, Dongsik ;
Jeong, Hyun Kwang ;
Kim, Woojoon ;
Kim, Jaehyeong ;
Hur, Inseok ;
Kim, Dae Hwan ;
Kim, Dong Myong .
IEEE ELECTRON DEVICE LETTERS, 2012, 33 (03) :399-401
[7]   A Semi-Analytical Extraction Method for Interface and Bulk Density of States in Metal Oxide Thin-Film Transistors [J].
Chen, Weifeng ;
Wu, Weijing ;
Zhou, Lei ;
Xu, Miao ;
Wang, Lei ;
Ning, Honglong ;
Peng, Junbiao .
MATERIALS, 2018, 11 (03)
[8]   Instabilities in Amorphous Oxide Semiconductor Thin-Film Transistors [J].
Conley, John F., Jr. .
IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY, 2010, 10 (04) :460-475
[9]   Physical Modeling of Amorphous InGaZnO Thin-Film Transistors: The Role of Degenerate Conduction [J].
Ghittorelli, Matteo ;
Torricelli, Fabrizio ;
Kovacs-Vajna, Zsolt Miklos .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2016, 63 (06) :2417-2423
[10]   Accurate Analytical Physical Modeling of Amorphous InGaZnO Thin-Film Transistors Accounting for Trapped and Free Charges [J].
Ghittorelli, Matteo ;
Torricelli, Fabrizio ;
Colalongo, Luigi ;
Kovacs-Vajna, Zsolt Miklos .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2014, 61 (12) :4105-4112