Unveiling the effect of crystal orientation on gallium nitride cutting through MD simulation

被引:15
作者
Wang, Yongqiang [1 ,2 ]
Zhang, Shuaiyang [1 ]
Xia, Hao [1 ]
Wu, Yueqin [3 ]
Huang, Han [2 ]
机构
[1] Univ South China, Sch Mech Engn, Hengyang 421001, Hunan, Peoples R China
[2] Univ Queensland, Sch Mech & Min Engn, St Lucia, Qld 4072, Australia
[3] Huaqiao Univ, Inst Mfg Engn, Xiamen 361021, Fujian, Peoples R China
关键词
Nanometric cutting; Gallium nitride; Molecular dynamics; Simulation; Deformation; THIN-FILMS; GAN; DEFORMATION; INDENTATION; SILICON; NANOINDENTATION; PLANARIZATION; DISLOCATIONS; MECHANISMS; REMOVAL;
D O I
10.1016/j.ijmecsci.2023.108619
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
Gallium nitride (GaN) is a hard and brittle single crystal and shaping it into thin substrates for semiconductor applications is challenging. The quality of the machined surface can vary depending on the cutting orientation, primarily due to the hexagonal lattice structure of GaN. Therefore, understanding how crystallite orientation affects the cutting performance is crucial before developing a cost-effective machining process for GaN. This study used molecular dynamics (MD) simulation to investigate the cutting of GaN along different crystal orientations. Single grit cutting was performed to validate the simulation results. The simulation revealed distinct outcomes for different cutting directions. When cutting on a-plane or along the [-2110] direction on m-plane, removal efficiency was enhanced due to lower cutting resistance, and more dislocations were generated in the subsurface compared to other cutting directions. However, less phase transition and amorphization were induced, indicating lower energy consumption and smaller forces or stresses involved. Conversely, the cutting on c-plane or along the [0001] direction on m-plane showed the potential for achieving better surface integrity. This study provided valuable insights into the effect of crystallite orientation on the cutting performance of GaN and demonstrated that appropriate selection of cutting directions could result in improved surface quality, which are valuable for developing cost-effective machining technologies for GaN single crystals.
引用
收藏
页数:15
相关论文
共 70 条
[1]   Analysis of mechanically induced subsurface damage and its removal by chemical mechanical polishing for gallium nitride substrate [J].
Aida, Hideo ;
Takeda, Hidetoshi ;
Doi, Toshiro .
PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY, 2021, 67 :350-358
[2]   Ultraprecision CMP for sapphire, GaN, and SiC for advanced optoelectronics materials [J].
Aida, Hideo ;
Doi, Toshiro ;
Takeda, Hidetoshi ;
Katakura, Haruji ;
Kim, Seong-Woo ;
Koyama, Koji ;
Yamazaki, Tsutomu ;
Uneda, Michio .
CURRENT APPLIED PHYSICS, 2012, 12 :S41-S46
[3]   Effect of Polishing Parameters on Chemical Mechanical Planarization of C-Plane (0001) Gallium Nitride Surface Using SiO2 and Al2O3 Abrasives [J].
Asghar, Khushnuma ;
Qasim, Mohd ;
Das, D. .
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2014, 3 (08) :P277-P284
[4]   On the atomic structures, mobility and interactions of extended defects in GaN:: dislocations, tilt and twin boundaries [J].
Bere, A. ;
Serra, A. .
PHILOSOPHICAL MAGAZINE, 2006, 86 (15) :2159-2192
[5]   Indentation-induced damage in GaN epilayers [J].
Bradby, JE ;
Kucheyev, SO ;
Williams, JS ;
Wong-Leung, J ;
Swain, MV ;
Munroe, P ;
Li, G ;
Phillips, MR .
APPLIED PHYSICS LETTERS, 2002, 80 (03) :383-385
[6]   Canonical sampling through velocity rescaling [J].
Bussi, Giovanni ;
Donadio, Davide ;
Parrinello, Michele .
JOURNAL OF CHEMICAL PHYSICS, 2007, 126 (01)
[7]   Molecular Dynamics Simulation on B3-GaN Thin Films under Nanoindentation [J].
Chen, Chen ;
Li, Haitao ;
Xiang, Henggao ;
Peng, Xianghe .
NANOMATERIALS, 2018, 8 (10)
[8]   SILICON NANOPARTICLES Isolation leads to change [J].
Cross, Graham L. W. .
NATURE NANOTECHNOLOGY, 2011, 6 (08) :467-468
[9]   A numerical study on subsurface quality and material removal during ultrasonic vibration assisted cutting of monocrystalline silicon by molecular dynamics simulation [J].
Dai, Houfu ;
Chen, Jingjing ;
Liu, Guojie .
MATERIALS RESEARCH EXPRESS, 2019, 6 (06)
[10]   Plasma-assisted polishing of gallium nitride to obtain a pit-free and atomically flat surface [J].
Deng, H. ;
Endo, K. ;
Yamamura, K. .
CIRP ANNALS-MANUFACTURING TECHNOLOGY, 2015, 64 (01) :531-534