Hierarchical modeling for TCAD simulation of short-channel 2D material-based FETs

被引:6
|
作者
Silvestri, Luca [1 ]
Palsgaard, Mattias [2 ]
Rhyner, Reto [1 ]
Frey, Martin [1 ]
Wellendorff, Jess [2 ]
Smidstrup, Soren [2 ]
Gull, Ronald [1 ]
El Sayed, Karim [3 ]
机构
[1] Synopsys Switzerland LLC, Zurich, Switzerland
[2] Synopsys Denmark ApS, Copenhagen, Denmark
[3] Synopsys Inc, Mountain View, CA USA
关键词
Ab initio; DFT; Band structure; Effective mass; NEGF; TCAD; Short-channel; MoS2; WS2; 2D-FET;
D O I
10.1016/j.sse.2022.108533
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
An integrated hierarchical modeling flow for fast analysis and prototyping of 2D material-based field-effect transistors (FETs) is presented. Advanced transport simulators using ab initio atomistic density functional theory (DFT) and continuum effective mass non-equilibrium Green's Functions (NEGF) consistently provide TCAD tools with device material and component parameters and reference curves for physical model selection and calibration. We validate each step of the hierarchical flow, and we show that the simulations performed with the resulting TCAD setup accurately predict 2D-FETs device characteristics.
引用
收藏
页数:5
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