On the Melting Thresholds of Semiconductors under Nanosecond Pulse Laser Irradiation

被引:3
|
作者
Beranek, Jiri [1 ,2 ]
Bulgakov, Alexander V. [1 ]
Bulgakova, Nadezhda M. [1 ]
机构
[1] Inst Phys Czech Acad Sci, HiLASE Ctr, Za Radnici 828, Dolni Brezany 25241, Czech Republic
[2] Czech Tech Univ, Fac Nucl Sci & Phys Engn, Trojanova 13, Prague 12001, Czech Republic
来源
APPLIED SCIENCES-BASEL | 2023年 / 13卷 / 06期
关键词
pulsed laser; nanosecond; laser processing; semiconductors; melting; thermal model; finite difference method; material properties; TIME-RESOLVED REFLECTIVITY; AMORPHOUS-GERMANIUM FILMS; OPTICAL-PROPERTIES; PHASE-TRANSITIONS; LIQUID SILICON; GAAS; SI; TEMPERATURE; ABLATION; CDTE;
D O I
10.3390/app13063818
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
In this work, a unified numerical model is used to determine the melting thresholds and to investigate the early stages of melting of several crystalline semiconductors (Si, Ge, GaAs, CdTe and InP) irradiated by nanosecond laser pulses. A molten fraction approach is used for continuous transition over the melting point. The results are compared with previously published theoretical and experimental data. A survey on the thermophysical and optical properties of the selected materials has been carried out to gather the most relevant data on temperature dependent properties for the solid and liquid states of these semiconductors where such data are available. A generalization of the obtained results is established that enables evaluation of the melting thresholds for different semiconductors based on their properties and irradiation conditions (laser wavelength, pulse duration).
引用
收藏
页数:16
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