Dislocation entangled mechanisms in cu-graphene nanocomposite fabricated by high-pressure sintering

被引:6
作者
Khobragade, Nidhi [1 ]
Maity, Tapabrata [1 ]
Swiderska-Sroda, Anna [2 ]
Stanislaw, Gierlotka [2 ]
Lojkowski, Witold [2 ]
Babu, Pokula Narendra [3 ]
Pal, Snehanshu [3 ]
Roy, Debdas [1 ]
机构
[1] Natl Inst Adv Mfg Technol NIFFT, Dept Mat & Met Engn, Ranchi 834003, India
[2] Polish Acad Sci, Inst High Pressure Phys Unipress, Sololowska 29, PL-01142 Warsaw, Poland
[3] Natl Inst Technol, Dept Met & Mat Engn, Rourkela 769008, India
关键词
Cu-graphene nanocomposite; High-pressure sintering; Electrical conductivity; Nanoindentation; Molecular dynamics simulation;
D O I
10.1016/j.matchar.2022.112524
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Graphene reinforced Cu-based nanocomposite (Cu-Gr), synthesized using high-pressure forming (-8 GPa) route at 300 degrees C, achieved 96% of relative density and 84% IACS improvement in electrical conductivity, along with a significant increase in hardness and Young's modulus up to-94 GPa. The structure and defects evolution of NC -Cu and Cu-Gr nanocomposites were investigated using nanoindentation approach, and then backed up compu-tationally. Molecular dynamics (MD) simulations results are well agreed with experimental data, which signif-icantly reveled that grain growth and grain boundary sliding (GBS) are dominant deformation mechanism involves grain boundary movement through dislocation motion, stacking faults (SFs) and twin boundary (TBs) formation, along with matrix failure through grain growth and GBS with an increase in loading, and subse-quently bending (bow shape) processes.
引用
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页数:7
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