Thermoelectric properties of Indium doped skutterudite thick film synthesized by a facile technique of electrochemical deposition

被引:1
作者
Sabran, Nuur Syahidah [1 ]
Fadzallah, Iman Aris [1 ]
Sabri, Mohd Faizul Mohd [1 ,2 ]
Ono, Takahito [3 ]
机构
[1] Univ Malaya, Fac Engn, Dept Mech Engn, Kuala Lumpur 50603, Malaysia
[2] Univ Malaya, Ctr Energy Sci, Kuala Lumpur 50603, Malaysia
[3] Tohoku Univ, Grad Sch Engn, Dept Mech Syst Engn, Sendai 9808579, Japan
关键词
Indium; Electrochemical deposition; Thermoelectric; Thick film; Skutterudites; TRANSPORT-PROPERTIES; THERMAL-CONDUCTIVITY; ELECTRODEPOSITION; NUCLEATION; GROWTH; PERFORMANCE; ANTIMONY; COPPER; MECHANISMS; FIGURE;
D O I
10.1016/j.jmat.2023.02.013
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Doped/filled skutterudites are much studied materials due to their excellent thermoelectric performance. However, their synthesis and preparation is complicated. This work synthesized indium (In) doped cobalt triantimonide (CoSb3) skutterudite thick films using a facile electrochemical deposition technique through chronoamperometric steps for 2 h. The nominal composition of In element is found in the range of 0.55-0.23 for a stoichiometric condition of In doped CoSb3 thick films. The early crystal growth of In doped films shows instantaneous nucleation and is controlled by the charge transfer process with diffusion coefficient, D of 10(-5) cm(2)/s. The incorporation of In into the interstitial sites of CoSb3 cages is evident from the lattice constant (a) expansion as observed in XRD. The optimum Seeback coefficient (S) of the 0.5 mmol In doped CoSb3 thick film is -89.84 mu V/K at 282 K, due to an increase in the carrier concentration (n similar to 10(20) cm(-3)). The negative S is due to the electron donor behaviour of the In. Meanwhile, high electrical conductivity, sigma value (14.26 kS/m) contributes to a power factor (S-2 sigma) increment of 115.11 mu W/(m center dot K-2). The result shows a promising thermoelectric property of doped skutterudite synthesized by electrochemical deposition technique. (c) 2023 The Authors. Published by Elsevier B.V. on behalf of The Chinese Ceramic Society. This is an open access article under the CC BY license (http://creativecommons.org/licenses/by/4.0/).
引用
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页码:899 / 909
页数:11
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