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Connecting Higher-Order Topology with the Orbital Hall Effect in Monolayers of Transition Metal Dichalcogenides
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作者:

Costa, Marcio
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Univ Fed Fluminense, Inst Fis, BR-24210346 Niteroi, RJ, Brazil Univ Fed Fluminense, Inst Fis, BR-24210346 Niteroi, RJ, Brazil

Focassio, Bruno
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机构:
Fed Univ ABC UFABC, BR-09210580 Santo Andre, SP, Brazil
Ilum Sch Sci, CNPEM, BR-13083970 Campinas, Brazil Univ Fed Fluminense, Inst Fis, BR-24210346 Niteroi, RJ, Brazil

Canonico, Luis M.
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机构:
CSIC, Catalan Inst Nanosci & Nanotechnol ICN2, Barcelona 08193, Spain
Campus UAB, BIST, Barcelona 08193, Spain Univ Fed Fluminense, Inst Fis, BR-24210346 Niteroi, RJ, Brazil

Cysne, Tarik P.
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Univ Fed Fluminense, Inst Fis, BR-24210346 Niteroi, RJ, Brazil Univ Fed Fluminense, Inst Fis, BR-24210346 Niteroi, RJ, Brazil

Schleder, Gabriel R.
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Harvard Univ, John A Paulson Sch Engn & Appl Sci, Cambridge, MA 02138 USA Univ Fed Fluminense, Inst Fis, BR-24210346 Niteroi, RJ, Brazil

Muniz, R. B.
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Univ Fed Fluminense, Inst Fis, BR-24210346 Niteroi, RJ, Brazil Univ Fed Fluminense, Inst Fis, BR-24210346 Niteroi, RJ, Brazil

Fazzio, Adalberto
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Fed Univ ABC UFABC, BR-09210580 Santo Andre, SP, Brazil
Ilum Sch Sci, CNPEM, BR-13083970 Campinas, Brazil Univ Fed Fluminense, Inst Fis, BR-24210346 Niteroi, RJ, Brazil

Rappoport, Tatiana G.
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机构:
Univ Lisbon, Inst Telecomun, Inst Super Tecn, Ave Rovisco Pais 1, P-1049001 Lisbon, Portugal
Univ Fed Rio De Janeiro, Inst Fis, Caixa Postal 68528, BR-21941972 Rio De Janeiro, Brazil Univ Fed Fluminense, Inst Fis, BR-24210346 Niteroi, RJ, Brazil
机构:
[1] Univ Fed Fluminense, Inst Fis, BR-24210346 Niteroi, RJ, Brazil
[2] Fed Univ ABC UFABC, BR-09210580 Santo Andre, SP, Brazil
[3] Ilum Sch Sci, CNPEM, BR-13083970 Campinas, Brazil
[4] CSIC, Catalan Inst Nanosci & Nanotechnol ICN2, Barcelona 08193, Spain
[5] Campus UAB, BIST, Barcelona 08193, Spain
[6] Harvard Univ, John A Paulson Sch Engn & Appl Sci, Cambridge, MA 02138 USA
[7] Univ Lisbon, Inst Telecomun, Inst Super Tecn, Ave Rovisco Pais 1, P-1049001 Lisbon, Portugal
[8] Univ Fed Rio De Janeiro, Inst Fis, Caixa Postal 68528, BR-21941972 Rio De Janeiro, Brazil
基金:
巴西圣保罗研究基金会;
关键词:
SPIN;
PSEUDOPOTENTIALS;
D O I:
10.1103/PhysRevLett.130.116204
中图分类号:
O4 [物理学];
学科分类号:
0702 ;
摘要:
Monolayers of transition metal dichalcogenides (TMDs) in the 2H structural phase have been recently classified as higher-order topological insulators (HOTIs), protected by C-3 rotation symmetry. In addition, theoretical calculations show an orbital Hall plateau in the insulating gap of TMDs, characterized by an orbital Chern number. We explore the correlation between these two phenomena in TMD monolayers in two structural phases: the noncentrosymmetric 2H and the centrosymmetric 1T. Using density functional theory, we confirm the characteristics of 2H TMDs and reveal that 1T TMDs are identified by a Z(4) topological invariant. As a result, when cut along appropriate directions, they host conducting edge states, which cross their bulk energy-band gaps and can transport orbital angular momentum. Our linear response calculations thus indicate that the HOTI phase is accompanied by an orbital Hall effect. Using general symmetry arguments, we establish a connection between the two phenomena with potential implications for orbitronics and spin orbitronics.
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