Multi-level resistive switching in hafnium-oxide-based devices for neuromorphic computing

被引:18
|
作者
Hellenbrand, Markus [1 ]
MacManus-Driscoll, Judith [1 ]
机构
[1] Univ Cambridge, Dept Mat Sci & Met, 27 Charles Babbage Rd, Cambridge CB3 0FS, England
关键词
RANDOM-ACCESS MEMORIES; LOW-POWER; SYNAPTIC PLASTICITY; HFO2-BASED RRAM; MEMRISTOR; LAYER; PERFORMANCE; BILAYER; ENHANCEMENT; COEXISTENCE;
D O I
10.1186/s40580-023-00392-4
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In the growing area of neuromorphic and in-memory computing, there are multiple reviews available. Most of them cover a broad range of topics, which naturally comes at the cost of details in specific areas. Here, we address the specific area of multi-level resistive switching in hafnium-oxide-based devices for neuromorphic applications and summarize the progress of the most recent years. While the general approach of resistive switching based on hafnium oxide thin films has been very busy over the last decade or so, the development of hafnium oxide with a continuous range of programmable states per device is still at a very early stage and demonstrations are mostly at the level of individual devices with limited data provided. On the other hand, it is positive that there are a few demonstrations of full network implementations. We summarize the general status of the field, point out open questions, and provide recommendations for future work.
引用
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页数:20
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