ZnO nanowire network/4H-SiC heterojunction for improved performance ultraviolet photodetector: The effect of different SiC doping concentrations on photoresponse properties

被引:10
作者
Kuang, Dan [1 ]
Kitai, Adrian H. [2 ]
Yu, Zhinong [1 ]
机构
[1] Beijing Inst Technol, Beijing Engn Res Ctr Mixed Real & Adv Display Tech, Sch Opt & Photon, Beijing 100081, Peoples R China
[2] McMaster Univ, Dept Engn Phys, Dept Mat Sci & Engn, Hamilton, ON L8S 4L8, Canada
基金
中国国家自然科学基金; 加拿大自然科学与工程研究理事会;
关键词
Zinc oxide; Silicon carbide; Heterojunction; Doping concentration; Tunneling; Ultraviolet photodetector; FABRICATION; TEMPERATURE;
D O I
10.1016/j.mtcomm.2023.105712
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Zinc Oxide (ZnO) and Silicon Carbide (SiC) are highly promising semiconductors with their heterostructures offering pathways for the next generation of sensing and detecting optoelectronics technologies due to their wide bandgaps. Optoelectric properties of ZnO nanowire network and n-type single crystal 4H-SiC heterojunction ultraviolet (UV) photodetectors have been investigated and compared for two different SiC doping concentra-tions. The fabrication of a high-performance UV photodetector based on a ZnO/4H-SiC heterojunction with high SiC doping concentration of 10(18)/cm(3) was achieved. Its optoelectronic performance was improved compared with either a ZnO UV photodetector or a ZnO/SiC heterojunction photodetector with low SiC doping concen-tration of 10(16)/cm(3). Heterojunction constructing and energy band bending in the ZnO/SiC interface facilitates the spatial separation of the photogenerated electron-hole pairs and the efficient transport of photoinduced charge carriers, which enhances photocurrent and simultaneously enables a quick time response in the device. In addition, carriers tunneling occurs in the heterojunction interface of ZnO/n(+)SiC with narrower depletion region width. This study suggests an opportunity for large-area and high-performance nanostructured optoelectronic devices fabrication based on a simple synthesis process and energy band engineering.
引用
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页数:8
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