Modern Scanning Electron Microscopy. 1. Secondary Electron Emission

被引:1
|
作者
Novikov, Yu. A. [1 ]
机构
[1] Russian Acad Sci, Prokhorov Gen Phys Inst, Moscow 119991, Russia
来源
JOURNAL OF SURFACE INVESTIGATION | 2023年 / 17卷 / 03期
关键词
scanning electron microscopy; secondary electron emission; mechanisms of emission; ionization mechanism; shake-off effect; slow secondary electrons; backscattered electrons; Monte Carlo method; METROLOGY; SYSTEM;
D O I
10.1134/S1027451023030138
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The development of modern technologies, including nanotechnology, is based on the application of methods for the diagnostics of objects used in technologies processes. For this purpose, most promising methods are those implemented using a scanning electron microscope. Moreover, one of the basic methods is the measurement of linear sizes of relief structures of micrometer and nanometer ranges used in microelectronics and nanoelectronics. The basis of operation of scanning electron microscopes is the secondary electron emission of a solid body. However, practically all known regularities of secondary electron emission have been obtained for surfaces, the relief of which was neglected. A review of theoretical and experimental materials of studying the secondary electron emission of solid bodies on surfaces without a relief is given. Practically all known regularities have been verified in experiments and have received their own physical explanation. However, the application of secondary electron emission in scanning electron microscopy, used in microelectronics, nanoelectronics and nanotechnology, requires knowledge of the regularities, which emerge on relief surfaces. The regularities that can be applied in a scanning electron microscope to measure the linear sizes of relief structures are demonstrated. A conclusion is drawn as to the necessity of studying the influence of the surface relief of a solid body on secondary electron emission.
引用
收藏
页码:598 / 611
页数:14
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