Effects of annealing temperature on the phase formation, optical, photoluminescence and magnetic properties of sol-gel YFeO3 films

被引:8
作者
Baqiah, Hussein [1 ]
Kechik, Mohd Mustafa Awang [2 ]
Al-Gaashani, Rashad [3 ]
Al-Zahrani, Asla A. [4 ]
Al-Hada, Naif Mohammed [1 ]
Zhang, Na [1 ]
Liu, Jian [1 ]
Xu, Shicai [1 ]
机构
[1] Dezhou Univ, Inst Biophys, Shandong Key Lab Biophys, 566 Univ Rd West, Dezhou, Shandong, Peoples R China
[2] Univ Putra Malaysia, Phys Dept, Fac Sci, Serdang 43400, Selangor, Malaysia
[3] Hamad Bin Khalifa Univ HBKU, Qatar Fdn, Qatar Environm & Energy Res Inst QEERI, POB 34110, Doha, Qatar
[4] Imam Abdulrahman Bin Faisal Univ, Coll Sci, Chem Dept, Dammam, Eastern Region, Saudi Arabia
关键词
YFeO3; film; Sol-gel process; Annealing temperature; Band gap; Photoluminescence Magnetization; BIFEO3; THIN-FILMS; STRAIN;
D O I
10.1016/j.ceramint.2022.09.028
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
YFeO3 (YFO) thin films were deposited onto quartz substrates via sol-gel spin-coating technique and annealed at different temperature ranged between 650 and 900 degrees C. The impact of annealing temperature on the phase formation, microstructural, optical, photoluminescence (PL) and magnetic properties of the films were systematically investigated. X-ray diffraction analysis revealed an amorphous structure in film annealed at 650 degrees C and formation of hexagonal-YFO (h-YFO) phase in films annealed at 750-800 degrees C. The films annealed at 850-900.C exhibited an orthorhombic-YFO (o-YFO) structure. Atomic force microscopy images of h-YFO films showed homogeneous surface with uniform particles size and shape. The particle size increased and had irregular shape in o-YFO films. The average particle size was 44 and 117 nm, while the root square roughness was 1.38 and 2.55 nm for h- and o-YFO films annealed at 750 and 850 degrees C, respectively. The optical band gap (Eg) was 2.53 and 2.86 eV for h- and o-YFO films annealed at 750 and 850.C, respectively. The PL spectra of h-YFO films were redshifted compared with that of o-YFO films. The PL emission related to near band edge was observed at 459.0 and 441.9 nm for h- and o-YFO films annealed at 750 and 850 degrees C, respectively. The magnetization was enhanced with the increasing of annealing temperature and has the value of 4.8 and 12.5 emu/cm(3) at 5000 Oe for h- and oYFO films annealed at 750 and 850 degrees C, respectively.
引用
收藏
页码:600 / 606
页数:7
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