Research Progress in Capping Diamond Growth on GaN HEMT: A Review

被引:7
作者
Wang, Yingnan [1 ,2 ]
Hu, Xiufei [1 ,2 ]
Ge, Lei [1 ,2 ]
Liu, Zonghao [3 ]
Xu, Mingsheng [1 ,2 ]
Peng, Yan [1 ,2 ]
Li, Bin [1 ,2 ]
Yang, Yiqiu [1 ,2 ]
Li, Shuqiang [1 ,2 ]
Xie, Xuejian [1 ,2 ]
Wang, Xiwei [1 ,2 ]
Xu, Xiangang [1 ,2 ]
Hu, Xiaobo [1 ,2 ]
机构
[1] Shandong Univ, Inst Novel Semicond, Jinan 250100, Peoples R China
[2] Shandong Univ, State Key Lab Crystal Mat, Jinan 250100, Peoples R China
[3] Shandong Univ, Sch Microelect, Jinan 250100, Peoples R China
关键词
diamond; GaN HEMTs; thermal management; CHEMICAL-VAPOR-DEPOSITION; NANOCRYSTALLINE DIAMOND; THERMAL-CONDUCTIVITY; ALGAN/GAN HEMTS; SUBSTRATE-TEMPERATURE; ELECTRONIC-PROPERTIES; LATTICE-PARAMETERS; ENHANCED DIAMOND; HEAT SPREADER; FILMS;
D O I
10.3390/cryst13030500
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
With the increased power density of gallium nitride (GaN) high electron mobility transistors (HEMTs), effective cooling is required to eliminate the self-heating effect. Incorporating diamond into GaN HEMT is an alternative way to dissipate the heat generated from the active region. In this review, the four main approaches for the integration of diamond and GaN are briefly reviewed, including bonding the GaN wafer and diamond wafer together, depositing diamond as a heat-dissipation layer on the GaN epitaxial layer or HEMTs, and the epitaxial growth of GaN on the diamond substrate. Due to the large lattice mismatch and thermal mismatch, as well as the crystal structure differences between diamond and GaN, all above works face some problems and challenges. Moreover, the review is focused on the state-of-art of polycrystalline or nanocrystalline diamond (NCD) passivation layers on the topside of GaN HEMTs, including the nucleation and growth of the diamond on GaN HEMTs, structure and interface analysis, and thermal characterization, as well as electrical performance of GaN HEMTs after diamond film growth. Upon comparing three different nucleation methods of diamond on GaN, electrostatic seeding is the most commonly used pretreatment method to enhance the nucleation density. NCDs are usually grown at lower temperatures (600-800 degrees C) on GaN HEMTs, and the methods of "gate after growth" and selective area growth are emphasized. The influence of interface quality on the heat dissipation of capped diamond on GaN is analyzed. We consider that effectively reducing the thermal boundary resistance, improving the regional quality at the interface, and optimizing the stress-strain state are needed to improve the heat-spreading performance and stability of GaN HEMTs. NCD-capped GaN HEMTs exhibit more than a 20% lower operating temperature, and the current density is also improved, which shows good application potential. Furthermore, the existing problems and challenges have also been discussed. The nucleation and growth characteristics of diamond itself and the integration of diamond and GaN HEMT are discussed together, which can more completely explain the thermal diffusion effect of diamond for GaN HEMT and the corresponding technical problems.
引用
收藏
页数:25
相关论文
共 50 条
  • [31] Research on nano-scale AlN nucleation layer growth and GaN HEMT characteristics based on MOCVD technology
    Zhang, Dongguo
    Li, Zhonghui
    Guo, Huaixin
    Peng, Daqing
    Yang, Qiankun
    Li, Chuanhao
    Luo, Weike
    [J]. JOURNAL OF CRYSTAL GROWTH, 2023, 610
  • [32] A new growth method of semi-insulating GaN layer for HEMT structure by eliminating degenerate layer at GaN/sapphire interface
    Shin, In-Su
    Kim, Donghyun
    Lee, Donghyun
    Koh, Yumin
    Song, Keun Man
    Shin, Chan Soo
    Park, Yongjo
    Yoon, Euijoon
    [J]. CURRENT APPLIED PHYSICS, 2015, 15 : S11 - S15
  • [33] Growth and character stics of AlGaN/GaN HEMT structures with AlN/GaN superlattices as barrier layers
    Ding Guo-Jian
    Guo Li-Wei
    Xing Zhi-Gang
    Chen Yao
    Xu Pei-Qiang
    Jia Hai-Qiang
    Zhou Jun-Ming
    Chen Hong
    [J]. ACTA PHYSICA SINICA, 2010, 59 (08) : 5724 - 5729
  • [34] Research Progress of Brazing Diamond and Application of Tools
    Mao Y.
    Hei H.
    Gao J.
    Zheng K.
    Yu S.
    Wang Y.
    [J]. Jixie Gongcheng Xuebao/Journal of Mechanical Engineering, 2022, 58 (04): : 80 - 93
  • [35] Research progress in the postprocessing and application of GaN crystal
    Li, Qiubo
    Yu, Jiaoxian
    Wang, Shouzhi
    Wang, Guodong
    Liu, Guangxia
    Liu, Lei
    Zhang, Shiying
    Xu, Xiangang
    Zhang, Lei
    [J]. CRYSTENGCOMM, 2023, 25 (05) : 715 - 725
  • [36] Growth and characterization of AlGaN/GaN HEMT structures on 3C-SiC/Si(111) templates
    Cordier, Yvon
    Portail, Marc
    Chenot, Sebastien
    Tottereau, Olivier
    Zielinski, Marcin
    Chassagne, Thierry
    [J]. SILICON CARBIDE AND RELATED MATERIALS 2007, PTS 1 AND 2, 2009, 600-603 : 1277 - +
  • [37] Comparison of GaN and AlN nucleation layers for the oriented growth of GaN on diamond substrates
    van Dreumel, G. W. G.
    Bohnen, T.
    Buijnsters, J. G.
    van Enckevort, W. J. P.
    ter Meulen, J. J.
    Hageman, P. R.
    Vlieg, E.
    [J]. DIAMOND AND RELATED MATERIALS, 2010, 19 (5-6) : 437 - 440
  • [38] Growth of GaN on nano-crystalline diamond substrates
    van Dreumel, G. W. G.
    Buijnsters, J. G.
    Bohnen, T.
    ter Meulen, J. J.
    Hageman, P. R.
    van Enckevort, W. J. P.
    Vlieg, E.
    [J]. DIAMOND AND RELATED MATERIALS, 2009, 18 (5-8) : 1043 - 1047
  • [39] Selective Growth of Diamond in Thermal Vias for GaN HEMTs
    Poust, Benjamin
    Gambin, Vincent
    Sandhu, Rajinder
    Smorchkova, Ioulia
    Lewis, Gregory
    Elmadjian, Raffi
    Li, Danny
    Geiger, Craig
    Heying, Benjamin
    Wojtowicz, Mike
    Oki, Aaron
    Pate, Bradford B.
    Feygelson, Tatyana
    Hobart, Karl
    [J]. 2013 IEEE COMPOUND SEMICONDUCTOR INTEGRATED CIRCUIT SYMPOSIUM (CSICS): INTEGRATED CIRCUITS IN GAAS, INP, SIGE, GAN AND OTHER COMPOUND SEMICONDUCTORS, 2013,
  • [40] Substrates with Diamond Heat Sink for Epitaxial GaN Growth
    Maiboroda, I. O.
    Chernykh, I. A.
    Sedov, V. S.
    Altakhov, A. S.
    Andreev, A. A.
    Grishchenko, Yu, V
    Kolobkova, E. M.
    Mart'yanov, A. K.
    Konov, V., I
    Zanaveskin, M. L.
    [J]. TECHNICAL PHYSICS LETTERS, 2021, 47 (05) : 353 - 356