Nonvolatile memory based on the extension-retraction of bent ferroelastic domain walls: A phase field simulation

Herein, a prototype nonvolatile bent ferroelastic domain wall (DW) memory based on extension-retraction of DWs in a top electrode/bent ferroelastic DWs/bottom electrode architecture is demonstrated and the effects of mechanical condition, electrical condition, and the material parameter on ferroelastic DWs in PbTiO3 ferroelectric thin films are studied by phase field modeling. Misfit strain can be used to drive the bend of DWs in PbTiO3 thin film, resulting in a change of ferroelastic domain size, bending degree, and conductivity. Stable and reversible switching of DWs between the extendible state with high conductivity and the retractile state with low conductivity can be realized, resulting in an apparent resistance change with a large ON/OFF ratio of >10(2) and an excellent retention characteristic. The extension and retraction speed, corresponding to data writing speed, can be adjusted by the electric field magnitude and distributions. The memory speed increases by 5% under a homogeneous electric field and 6% under an inhomogeneous probing electric field, after the buildup of space charges in a ferroelectric thin film, and the fastest memory speed is obtained at tip potential f = 1.8. Moreover, polarization orientations of a and c domains separated by bent ferroelastic DWs do not affect memory performance. This paper can guide the development of new ferroelectric domain wall memory.