Resonant tunneling induced large magnetoresistance in vertical van der Waals magnetic tunneling junctions based on type-II spin-gapless semiconductor VSi2P4

被引:1
作者
Han, Jiangchao [1 ,2 ]
Zhou, Daming [2 ,3 ]
Yang, Wei [2 ,3 ]
Lv, Chen [2 ,3 ]
Wang, Xinhe [2 ,3 ]
Wei, Guodong [2 ,3 ]
Zhao, Weisheng [2 ,3 ]
Lin, Xiaoyang [2 ,3 ]
Sang, Shengbo [1 ]
机构
[1] Taiyuan Univ Technol, Coll Elect Informat & Opt Engn, Taiyuan 030024, Peoples R China
[2] Beihang Univ, Inst Int Innovat, Natl Key Lab Spintron, Hangzhou 311115, Peoples R China
[3] Beihang Univ, Fert Beijing Inst, Sch Integrated Circuit Sci & Engn, MIIT Key Lab Spintron, Beijing 100191, Peoples R China
基金
北京市自然科学基金; 中国国家自然科学基金;
关键词
FERROMAGNETISM;
D O I
10.1039/d3tc03040g
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Rare type-II spin-gapless semiconductors (SGSs), in which electrons and holes are 100% spin polarized in different directions to the Fermi level, have attracted increasing attention. Motivated by the recent findings of type-II SGS VSi2P4 with ferromagnetic characteristics and a high Curie temperature (350 K), we investigated the interface contacts and spin transport properties of different devices composed of VSi2P4 ferromagnetic layers. It was found from the first-principles calculations combined with nonequilibrium Green's function that different potential barriers appear on the interface pinning and ultimately determine the conductive characteristics. The T-MoTe2/VSi2P4/H-MoTe2/VSi2P4/T-MoTe2 device (1H device) shows a large tunnel magnetoresistance (TMR) of 3.35 x 10(3)% resulting from the interfacial spin filtering, and the T-MoTe2/H-MoTe2/VSi2P4/H-MoTe2/VSi2P4/H-MoTe2/T-MoTe2 device (3H device) accompanied with many resonant states presents increased TMR (1.83 x 10(4)%). The transport properties of two devices are explained from the spin-dependent band structures, local density of states, transmission coefficients and eigenstates. These results indicate that VSi2P4 is a promising material for designing vertical van der Waals (vdW) heterostructures with a giant TMR in spintronic applications.
引用
收藏
页码:696 / 705
页数:10
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