High-responsivity silicon p-i-n mesa-photodiode

被引:8
作者
Kukurudziak, M. S. [1 ,2 ]
Maistruk, E., V [1 ]
机构
[1] Yuri Fedkovych Chernivtsi Natl Univ, Dept Elect & Power Engn, Chernovtsy, Ukraine
[2] Rhythm Optoelect Shareholding Co, Engn Prod Complex 1, Chernovtsy, Ukraine
关键词
photodiode; mesa-structure; responsivity; photoresist; dark current; LAYER;
D O I
10.1088/1361-6641/acdf14
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Silicon p-i-n mesa-photodiodes have been made. Different variants of masking coating during etching of the mesa-profile have been studied. Comparative characteristic of photodetectors manufacture by planar- and mesa-technology have been carried out. Defect formation on the surface of silicon substrates in different options of technology was investigated. Parameters of photodiodes manufactured by planar and meso-technology were investigated. Photodiodes with a meso-structure have higher responsivity and lower capacitance than samples made by conventional planar technology.
引用
收藏
页数:9
相关论文
共 30 条
[1]   Correcting the Characteristics of Silicon Photodiodes by Ion Implantation [J].
Asadchikov, V. E. ;
Dyachkova, I. G. ;
Zolotov, D. A. ;
Chukhovskii, F. N. ;
Nikitina, E. V. .
SEMICONDUCTORS, 2020, 54 (06) :666-671
[2]  
Bagraev NT, 2021, SEMICONDUCTORS+, V55, P137, DOI [10.1134/S106378262102007X, 10.21883/FTP.2021.02.50493.9538]
[3]  
Boltar K. O., 2013, Applied Physics, P10
[4]  
ckb-rhythm, PASSP DAT PD 15M 01
[5]  
excelitas, PASSP DAT YAG 555 4
[6]  
Fedorenko A V., 2020, TEKHNOL KONSTR ELEKT, V34, P17, DOI [10.15222/TKEA2020.3-4.17, DOI 10.15222/TKEA2020.3-4.17]
[7]  
first-sensor, PASSP DAT QP154 Q
[8]  
frast, PASSP DAT FP 383 FP
[9]   High-Speed High-Efficiency Photon-Trapping Broadband Silicon PIN Photodiodes for Short-Reach Optical Interconnects in Data Centers [J].
Ghandiparsi, Soroush ;
Elrefaie, Aly E. ;
Mayet, Ahmed S. ;
Landolsi, Taha ;
Bartolo-Pereze, Cesar ;
Cansizoglu, Hilal ;
Gao, Yang ;
Mamtaz, Hasina H. ;
Golgir, Hossein Rabiee ;
Devine, Ekaterina Ponizovskaya ;
Yamada, Toshishige ;
Wang, Shih-Yuan ;
Islam, M. Saif .
JOURNAL OF LIGHTWAVE TECHNOLOGY, 2019, 37 (23) :5748-5755
[10]   Role of surface passivation in integrated sub-bandgap silicon photodetection [J].
Gherabli, Rivka ;
Grajower, Meir ;
Shappir, Joseph ;
Mazurski, Noa ;
Wofsy, Menachem ;
Inbar, Naor ;
Khurgin, Jacob B. ;
Levy, Uriel .
OPTICS LETTERS, 2020, 45 (07) :2128-2131