Blocking the reverse reactions of overall water splitting on a Rh/GaN-ZnO photocatalyst modified with Al2O3

被引：136

作者：

Li, Zheng ^{[1
,2
]}

Li, Rengui ^{[1
]}

Jing, Huijuan ^{[1
,2
]}

Xiao, Jianping ^{[1
]}

Xie, Huichen ^{[1
,2
]}

Hong, Feng ^{[1
,2
]}

Ta, Na ^{[1
]}

Zhang, Xianwen ^{[1
,2
]}

Zhu, Jian ^{[1
]}

Li, Can ^{[1
,2
]}

机构：

[1] Chinese Acad Sci, Dalian Inst Chem Phys, State Key Lab Catalysis, Dalian Natl Lab Clean Energy, Dalian, Peoples R China

[2] Univ Chinese Acad Sci, Beijing, Peoples R China

来源：

NATURE CATALYSIS | 2023年 / 6卷 / 01期

基金：

中国国家自然科学基金;

关键词：

TOTAL-ENERGY CALCULATIONS; ATOMIC LAYER DEPOSITION; HYDROGEN-PRODUCTION; COCATALYST; NANOPARTICLES; EFFICIENCY; SHEETS; RH;

D O I：

10.1038/s41929-022-00907-y

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Sunlight-driven photocatalytic overall water splitting (OWS) presents a promising route towards solar-to-chemical energy conversion. However, OWS has been realized with only a few photocatalysts. Among the major reasons for this paucity are the reverse reactions that occur between OWS products, including hydrogen, oxygen and reactive intermediate species, on the photocatalyst surface. In this study we found that decorating the Rh co-catalyst of the benchmark photocatalyst GaN-ZnO with Al2O3 species by atomic layer deposition can suppress these reverse reactions to a great extent and consequently enhance the photocatalytic OWS activity by more than an order of magnitude, with an apparent quantum efficiency increase from 0.3% to 7.1% at 420 nm. The partial coverage of Rh surface sites with inert oxides can effectively suppress the reverse reactions by blocking the reduction/oxidation cycle of Rh atoms during the photocatalytic OWS reaction.

引用

页码：80 / 88

页数：9

共 46 条

[1] Ultrathin Microporous SiO2 Membranes Photodeposited on Hydrogen Evolving Catalysts Enabling Overall Water Splitting [J].