Uncovering a CF3 Effect on X-ray Absorption Energies of [Cu(CF3)4]- and Related Copper Compounds by Using Resonant Diffraction Anomalous Fine Structure (DAFS) Measurements

被引:40
作者
Alayoglu, Pinar [1 ]
Chang, Tieyan [2 ]
Yan, Connly [1 ]
Chen, Yu-Sheng [2 ]
Mankad, Neal P. [1 ]
机构
[1] Univ Illinois, Dept Chem, Chicago, IL 60607 USA
[2] Univ Chicago, NSFs ChemMatCARS, Argonne, IL 60439 USA
基金
美国国家科学基金会;
关键词
Anomalous Diffraction; Copper; High-Valent Metals; Oxidation State; Trifluoromethyl Ligands; CATALYZED DECARBOXYLATIVE TRIFLUOROMETHYLATION; FORMING REDUCTIVE ELIMINATION; ELECTRON-PARAMAGNETIC-RES; OXIDATIVE ADDITION; STATE; ARYL; COMPLEXES; CHEMISTRY; FLUORINE; HALIDE;
D O I
10.1002/anie.202313744
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Understanding the electronic structures of high-valent metal complexes aids the advancement of metal-catalyzed cross coupling methodologies. A prototypical complex with formally high valency is [Cu(CF3)(4)](-) (1), which has a formal Cu(III) oxidation state but whose physical analysis has led some to a Cu(I) assignment in an inverted ligand field model. Recent examinations of 1 by X-ray spectroscopies have led previous authors to contradictory conclusions, motivating the re-examination of its X-ray absorption profile here by a complementary method, resonant diffraction anomalous fine structure (DAFS). From analysis of DAFS measurements for a series of seven mononuclear Cu complexes including 1, here it is shown that there is a systematic trifluoromethyl effect on X-ray absorption that blue shifts the resonant Cu K-edge energy by 2-3 eV per CF3, completely accounting for observed changes in DAFS profiles between formally Cu(III) complexes like 1 and formally Cu(I) complexes like (Ph3P)(3)CuCF3 (3). Thus, in agreement with the inverted ligand field model, the data presented herein imply that 1 is best described as containing a Cu(I) ion with d(n) count approaching 10.
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页数:7
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