Analytical modeling and simulation of lattice-matched Ferro PZT AlGaN/GaN MOSHEMT for high-power and RF/Microwave applications

被引:4
|
作者
Khan, Abdul Naim [1 ]
Mishra, S. N. [2 ]
Routray, S. [3 ]
Chatterjee, Gaurav [1 ]
Jena, K. [1 ]
机构
[1] LNM Inst Informat Technol, Dept Elect & Commun Engn, Jaipur, India
[2] Kalinga Inst Ind Technol, Sch Elect Engn, Bhubaneswar, India
[3] SRM Inst Sci & Technol, Dept Elect & Commun Engn, Chennai, India
关键词
Ferro; Al2O3; AlGaN; AlN; GaN; 2-DEG; AlGaN barrier thickness; PZT; MOSHEMT; ELECTRON-MOBILITY TRANSISTORS; GAN MOS-HEMT; POLARIZATION; HFO2; CAPACITANCE; AL2O3; SI;
D O I
10.1007/s10825-023-02024-w
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We present an analytical model for Ferro PZT Al2O3/AlGaN/AlN/GaN MOSHEMT involving the solution of Poisson and Schrodinger equations. This analytical model covers most of the operating regimes of the Ferro PZT MOSHEMT. The two-dimensional electron gas (2-DEG) sheet charge density (n(s)), threshold voltage (V-th), drain current (I-ds), gate capacitance (C-gs and C-gd), and unit gain cutoff frequency(f(T)) model equations are presented and simulated with MATLAB tool. It is observed that the insertion of the Ferro Pb(Zr, Ti)O-3 PZT (lead zirconium titanate) material can improve the device's performance. The proposed Ferro PZT MOSHEMT model accurately predicts a higher drain current of 1.14 A/mm, a high transconductance of 362 S/mm, a gate-to-source capacitance of 50.99 pF, a gate-to-drain capacitance of 38.25 pF, and high cutoff frequency of 0.033 THz for 20 nm AlGaN barrier layer. The results show good agreement with the TCAD-Atlas simulation and are satisfactory for the different AlGaN barrier layer thicknesses. The generated model and simulation results show the potential of using the Ferro PZT MOSHEMT for high-power and RF/Microwave applications.
引用
收藏
页码:827 / 838
页数:12
相关论文
共 50 条
  • [1] Analytical modeling and simulation of lattice-matched Ferro PZT AlGaN/GaN MOSHEMT for high-power and RF/Microwave applications
    Abdul Naim Khan
    S. N. Mishra
    S. Routray
    Gaurav Chatterjee
    K. Jena
    Journal of Computational Electronics, 2023, 22 : 827 - 838
  • [2] RF/Analog and Linearity Performance Evaluation of Lattice-matched Ultra-thin AlGaN/GaN Gate Recessed MOSHEMT with Silicon Substrate
    Abdul Naim Khan
    K. Jena
    S. Routray
    G. Chatterjee
    Silicon, 2022, 14 : 8599 - 8608
  • [3] RF/Analog and Linearity Performance Evaluation of Lattice-matched Ultra-thin AlGaN/GaN Gate Recessed MOSHEMT with Silicon Substrate
    Khan, Abdul Naim
    Jena, K.
    Routray, S.
    Chatterjee, G.
    SILICON, 2022, 14 (14) : 8599 - 8608
  • [4] Advancing Electrical and Analog/RF Performance in Dual-Gate AlGaN/GaN MOSHEMT for High-Power and High-Frequency Applications
    Khan, Abdul Naim
    Jena, K.
    Chatterjee, Gaurav
    Chauhan, Meenakshi
    Lenka, Trupti Ranjan
    ARABIAN JOURNAL FOR SCIENCE AND ENGINEERING, 2025,
  • [5] BInGaN alloys nearly lattice-matched to GaN for high-power high-efficiency visible LEDs
    Williams, Logan
    Kioupakis, Emmanouil
    APPLIED PHYSICS LETTERS, 2017, 111 (21)
  • [6] AlGaN/AlN/GaN high-power microwave HEMT
    Shen, L
    Heikman, S
    Moran, B
    Coffie, R
    Zhang, NQ
    Buttari, D
    Smorchkova, IP
    Keller, S
    DenBaars, SP
    Mishra, UK
    IEEE ELECTRON DEVICE LETTERS, 2001, 22 (10) : 457 - 459
  • [7] Frequency-Characterization and Modeling of AlGaN/GaN HEMTs for High-Power Applications
    Garcia-Luque, A.
    Martin-Guerrero, T. M.
    Pradhan, M.
    Moser, M.
    Alomari, M.
    Burghartz, J. N.
    Schoch, B.
    Sharma, K.
    Kallfass, I
    2022 INTERNATIONAL WORKSHOP ON INTEGRATED NONLINEAR MICROWAVE AND MILLIMETRE-WAVE CIRCUITS (INMMIC), 2022,
  • [8] AlGaN/GaN heterojunction FETs for high-power applications
    Kuzuhara, M
    Ando, Y
    Inoue, T
    Okamoto, Y
    Kasahara, K
    Nakayama, T
    Miyamoto, H
    ELECTRONICS AND COMMUNICATIONS IN JAPAN PART II-ELECTRONICS, 2003, 86 (12): : 52 - 60
  • [9] High power AlGaN/GaN HEMTs for microwave applications
    Wu, YF
    Keller, BP
    Keller, S
    Kapolnek, D
    Kozodoy, P
    Denbaars, SP
    Mishra, UK
    SOLID-STATE ELECTRONICS, 1997, 41 (10) : 1569 - 1574
  • [10] High power AlGaN/GaN HEMTs for microwave applications
    Univ of California, Santa Barbara, United States
    Solid State Electron, 10 (1569-1574):