Eliminating the Double-Slope Behavior of Organic Field-Effect Transistors by Functionalizing the Dielectric Surface With a High Electron Affinity Self-Assembly Monolayer

被引:2
作者
Hu, Yuanhong [1 ]
Fu, Huaijie [1 ]
Zhang, Qiaoming [1 ]
Peng, Jinlei [1 ]
Wei, Jiyuan [1 ]
Tan, Xingwen [1 ]
Qiu, Xuejun [2 ]
Lei, Yanlian [1 ]
机构
[1] Southwest Univ, Sch Phys Sci & Technol, Chongqing Key Lab Micro & Nano Struct Optoelect, Chongqing 400715, Peoples R China
[2] Guangdong Prov Engn & Technol Res Ctr Light & Hlt, Sch Hlth Sci, Guangzhou 51000, Peoples R China
关键词
Double-slope behavior; electron affinity; organic field-effect transistor (OFET); self-assembly monolayer; MOBILITY OVERESTIMATION; OPERATIONAL STABILITY; EXTRACTION; TRANSPORT; VOLTAGE;
D O I
10.1109/TED.2023.3338152
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The commonly observed nonideal behavior (namely double-slope) in transfer characteristics of organic field-effect transistors (OFETs) is detrimental to the accurate assessment of carrier mobility. In this work, self-assembled monolayers (SAMs) with different end groups were used to adjust the electron affinity of dielectric surfaces to eliminate the double-slope behavior of OFETs. Results show that the OFETs based on the SAM with a high electron affinity end group of -CN (hereafter named SAM-CN device) display an ideal transfer curve without double-slope behavior and hysteresis. A series of cross-checks, including contact resistance and time-dependent measurements, have been carried out to experimentally confirm that electron traps at the channel/dielectric interface are the origin of double-slope behavior. Furthermore, the suppression of double-slope behavior in SAM-CN devices is attributed to the high electron affinity of the -CN group to withdraw electrons from the trap sites located at the conducting channel. Thus, our results provide an easy and feasible strategy to eliminate the double-slope behavior of OFETs by using a SAM with an appropriate electron affinity.
引用
收藏
页码:777 / 781
页数:5
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