A novel 4H-SiC accumulation mode MOSFET with ultra-low specific on-resistance and improved reverse recovery capability

被引:5
作者
Kong, Moufu [1 ,3 ]
Duan, Yuanmiao [1 ]
Zhang, Bingke [2 ]
Yan, Ronghe [1 ]
Yi, Bo [1 ]
Yang, Hongqiang [1 ,3 ]
机构
[1] Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Device, Chengdu, Peoples R China
[2] Beijing Inst Smart Energy, State Key Lab Adv Power Transmiss Technol, Beijing, Peoples R China
[3] Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Device, Chengdu 611731, Peoples R China
基金
中国国家自然科学基金;
关键词
power field-effect transistors; power MOSFET; power semiconductor devices; ELECTRON-MOBILITY; CHANNEL MOBILITY; SIC MOSFET; TEMPERATURE; CONTACTS;
D O I
10.1049/pel2.12556
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A novel 1440-V 4H-SiC accumulation mode MOSFET (ACCUFET) with ultra-low specific on-resistance and improved reverse recovery performance is proposed in this article. As for the proposed SiC ACCUFET, the channel region can be completely depleted by the P-type heavily doped polysilicon gate to build an electron barrier and realize a normally-off device. And a Schottky barrier diode (SBD) is integrated below the trench gates on both sides, which brings the feasibility of realizing reverse conduction function of the proposed ACCUFET. Also, the p-shield regions under the Schottky contact metal provide a good electric field shielding effect for the gate oxide. Compared with the conventional SiC trench MOSFET, the numerical simulation results show that the specific on-resistance (Ron,sp) of the proposed ACCUFET is reduced by more than 64%. The high-frequency figures-of-merit HFOM [Ron,sp x Cgd] and HFOM [Ron,sp x Qgd] of the proposed device are improved by 53.19% and 58.74%, respectively. The reverse recovery time (trr), and reverse recovery charge (Qrr) are reduced by 23.28% and 82.73%, respectively. In addition, the results also indicate that the proposed device has a better latch-up immunity compared with the conventional SiC trench MOSFET. The excellent device performance and the simple manufacturing process provide a good prospect for the application of the proposed device. A novel 1440-V 4H-SiC accumulation mode MOSFET (ACCUFET) with ultra-low specific on-resistance and improved reverse recovery performance is proposed in this article. The specific on-resistance (Ron,sp) of the proposed ACCUFET is reduced by more than 64%. The high-frequency figures-of-merit HFOM [Ron,sp x Cgd] and HFOM [Ron,sp x Qgd] of the proposed device are improved by 53.19% and 58.74%, respectively. The reverse recovery time (trr), and reverse recovery charge (Qrr) are reduced by 23.28% and 82.73%, respectively.image
引用
收藏
页码:2369 / 2377
页数:9
相关论文
共 36 条
[1]   Shallow electron traps at the 4H-SiC/SiO2 interface [J].
Afanas'ev, VV ;
Stesmans, A ;
Bassler, M ;
Pensl, G ;
Schulz, MJ .
APPLIED PHYSICS LETTERS, 2000, 76 (03) :336-338
[2]  
Baliga B.J., 2008, FUNDAMENTALS POWER S, V6, P279
[3]   THE ACCUMULATION-MODE FIELD-EFFECT TRANSISTOR - A NEW ULTRALOW ON-RESISTANCE MOSFET [J].
BALIGA, BJ ;
SYAU, TY ;
VENKATRAMAN, P .
IEEE ELECTRON DEVICE LETTERS, 1992, 13 (08) :427-429
[4]   Characteristics and Application of Normally-Off SiC-JFETs in Converters Without Antiparallel Diodes [J].
Cai, Chaofeng ;
Zhou, Weicheng ;
Sheng, Kuang .
IEEE TRANSACTIONS ON POWER ELECTRONICS, 2013, 28 (10) :4850-4860
[5]  
Callanan RJ, 2008, IEEE IND ELEC, P2792
[6]   Hysteresis in transfer characteristics in 4H-SiC depletion/accumulation-mode MOSFETs [J].
Chatty, K ;
Banerjee, S ;
Chow, TP ;
Gutmann, RJ .
IEEE ELECTRON DEVICE LETTERS, 2002, 23 (06) :330-332
[7]   Accumulation-layer electron mobility in n-channel 4H-SiC MOSFETs [J].
Chatty, K ;
Chow, TP ;
Gutmann, RJ ;
Arnold, E ;
Alok, D .
IEEE ELECTRON DEVICE LETTERS, 2001, 22 (05) :212-214
[8]   Improved inversion channel mobility for 4H-SiC MOSFETs following high temperature anneals in nitric oxide [J].
Chung, GY ;
Tin, CC ;
Williams, JR ;
McDonald, K ;
Chanana, RK ;
Weller, RA ;
Pantelides, ST ;
Feldman, LC ;
Holland, OW ;
Das, MK ;
Palmour, JW .
IEEE ELECTRON DEVICE LETTERS, 2001, 22 (04) :176-178
[9]   Reverse characteristics of a 4H-SiC Schottky barrier diode [J].
Hatakeyama, T ;
Shinohe, T .
SILICON CARBIDE AND RELATED MATERIALS 2001, PTS 1 AND 2, PROCEEDINGS, 2002, 389-3 :1169-1172
[10]  
Huang AQ, 2016, IEEE IND ELEC, P6996, DOI 10.1109/IECON.2016.7793121