Ultra-high carbon fullerene-based spin-on-carbon hardmasks

被引：0

作者：

Brown, A. G. ^{[1
]}

Dawson, G. ^{[1
]}

Jackson, E. ^{[2
]}

Schofield, B. ^{[2
]}

Lada, T. ^{[2
]}

Robinson, Alex P. G. ^{[1
,3
]}

机构：

[1] Birmingham Res Pk, Irresistible Mat Ltd, Birmingham B15 2SQ, W Midlands, England

[2] Nano C Inc, 33 Southwest Pk, Westwood, MA 02090 USA

[3] Univ Birmingham, Sch Chem Engn, Birmingham B15 2TT, W Midlands, England

来源：

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XL | 2023年 / 12498卷

关键词：

Spin-on Carbon; Organic Hard Mask; Fullerene; ICP Silicon Etching;

D O I：

10.1117/12.2658462

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Fullerene based spin-on-carbon enables very high carbon content, very high thermal stability, and shows etch resistance approaching amorphous carbon. Here we describe the performance of the HM1300 fullerene SOC, including results using high temperature inert atmosphere curing. Ohnishi numbers below 1.44 are achieved (measured by elemental analysis) and etch performance is improved over the standard bake.

引用

页数：9

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