Effect of low-energy ion-beam irradiation on the structure and electron transport of monolayer MoS2

被引:7
作者
Zhao, Yangzhou [1 ]
Ishiguro, Yasushi [2 ]
Takai, Kazuyuki [1 ,3 ]
机构
[1] Hosei Univ, Grad Sch Sci & Engn, Tokyo 1848584, Japan
[2] Tokyo Denki Univ, Dept Elect & Elect Engn, Tokyo 1208551, Japan
[3] Hosei Univ, Dept Chem Sci & Technol, Tokyo 1848584, Japan
关键词
MoS2; Ion-beam implantation; Raman spectroscopy; Photoluminescence; Electrical conductivity; SINGLE-LAYER; PHOTOLUMINESCENCE; TRANSITION; OXYGEN;
D O I
10.1016/j.nimb.2023.165095
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The presence of vacancies in two-dimensional (2D) materials, such as monolayer MoS2 (1L-MoS2), significantly affects their structural and electronic properties. In this study, 1L-MoS2 was irradiated with an Ar+ ion beam to introduce vacancies in a controlled manner. A complementary study that combines multiple evaluations was performed to verify the role of vacancies in the structural and electronic properties of MoS2. Raman spectroscopy and conductivity measurements reveal that the S vacancies, introduced into the MoS2 lattice prior to Mo vacancies at the lower dose region, cause electron-doping. The E' lattice vibration mode was more sensitive to vacancies than the A1' mode. According to photoluminescence studies, irradiating Ar+ at a lower dose of less than 3.8 x 1013 cm-2 does not change the band gap and only introduces mid-gap states, which is consistent with the smaller and larger influences of vacancies in carrier scattering and doping, respectively, in the electrical conductivity.
引用
收藏
页数:8
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