Photothermoelectric AZO/SiO2/NiO Device

被引:5
|
作者
Bianchi, Catarina [1 ]
Marques, Ana [1 ]
Ferreira, Isabel [1 ]
机构
[1] NOVA Univ Lisbon, CENIMAT i3N, Dept Mat Sci, Sch Sci & Technol, P-2829516 Largo Da Torre, Caparica, Portugal
关键词
infrared absorption; photothermoelectrics; transparent devices; THIN-FILMS;
D O I
10.1002/admt.202300133
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Transparent-conductive-oxide (TCO) materials and transparent devices combining photovoltage and thermoelectric effects are still scarce. Hence, a new transparent-conductive-oxide/insulating/transparent-semiconductor-oxide (TCO-I-TSO) structure combining such effects is developed. It is made of aluminum-doped zinc oxide (AZO)/SiO2/NiO thin films sequentially deposited on glass substrates. AZO exhibits thermo and photovoltage in response to gradient temperature and absorption of UV photons, while NIR photons absorption in the NiO layer. Photovoltage appears in the plane between the AZO and NiO layer when the whole sample is irradiated with near infrared light, and it also depends on the thickness of the SiO2 layer. This photovoltage is continuously monitored on samples placed in a glass window facing south. Throughout the day, the photovoltage varies from 0 to 300 mu V proportionally to the light intensity.
引用
收藏
页数:8
相关论文
共 50 条
  • [41] Length effect on the plastic deformation of SiO2 microcantilevers
    Balasubramanian, S.
    Prabakar, K.
    Sundari, S. Tripura
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2022, 148
  • [42] Preparation of SiO2 antireflective coatings by spray deposition
    Xiong, Huai
    Tang, Yongxing
    Hu, Lili
    Shen, Bin
    Li, Haiyuan
    14TH NATIONAL CONFERENCE ON LASER TECHNOLOGY AND OPTOELECTRONICS (LTO 2019), 2019, 11170
  • [43] Implementation of Ag/SiO2 nanofilms for metamaterial engineering
    Prepelita, Petronela
    Garoi, Florin
    Dumitru, Marius
    Craciun, Valentin
    RESULTS IN PHYSICS, 2022, 35
  • [44] Color stability of the abrasive Si/SiO2 films
    Yan, Caibo
    Su, Zhiwei
    Zhao, Zhuo
    Zhou, Yanwen
    CERAMICS INTERNATIONAL, 2025, 51 (06) : 7576 - 7583
  • [45] Deposition on thin SiO2 layer by reactive sputtering
    Radovic, I.
    Serruys, Y.
    Limoge, Y.
    Milosavljevic, M.
    Romcevic, N.
    Bibic, N.
    OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS, 2007, 1 (05): : 247 - 251
  • [46] Reactive sputtering deposition of SiO2 thin films
    Radovic, Ivan
    Serruys, Yves
    Limoge, Yves
    Bibic, Natasa
    JOURNAL OF THE SERBIAN CHEMICAL SOCIETY, 2008, 73 (01) : 121 - 126
  • [47] Spin synthesis of monolayer of SiO2 thin films
    Shinde, S. S.
    Park, S.
    Shin, J.
    JOURNAL OF SEMICONDUCTORS, 2015, 36 (04)
  • [48] Dielectric function of Si nanocrystals embedded in SiO2
    Gallas, B
    Kao, CC
    Defranoux, C
    Fisson, S
    Vuye, G
    Rivory, J
    THIN SOLID FILMS, 2004, 455 : 335 - 338
  • [49] Nanostructured porous SiO2 films for antireflection coatings
    Sobahan, K. M. A.
    Park, Yong Jun
    Kim, Jin Joo
    Hwangbo, Chang Kwon
    OPTICS COMMUNICATIONS, 2011, 284 (03) : 873 - 876
  • [50] Preparation and electrical conductivity of SiO2/polypyrrole nanocomposite
    Tang, Qunwei
    Sun, Xiaoming
    Li, Qinghua
    Lin, Jianming
    Wu, Jihuai
    JOURNAL OF MATERIALS SCIENCE, 2009, 44 (03) : 849 - 854