Ferroelectric-Gated All 2D Field-Effect Transistors with Sub-60 mV/dec Subthreshold Swing

被引:3
作者
Liu, Zhongyang [1 ]
Sun, Yilin [1 ,2 ]
Ding, Yingtao [1 ]
Li, Mingjie [1 ]
Liu, Xiao [1 ]
Liu, Zhifang [1 ]
Chen, Zhiming [1 ]
机构
[1] Beijing Inst Technol, Sch Integrated Circuits & Elect, Beijing 100081, Peoples R China
[2] BIT Chongqing Inst Microelect & Microsyst, Chongqing 401332, Peoples R China
基金
中国国家自然科学基金; 中国博士后科学基金;
关键词
NEGATIVE-CAPACITANCE; LOW-VOLTAGE; MOS2; NANOELECTRONICS; MEMORY;
D O I
10.1021/acs.jpclett.3c01463
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Withthe continuous scaling down of the modern integrated circuits,conventional metal-oxide-semiconductor field effect transistors arebecoming inefficient due to various nonideal effects such as enhancedshort-channel effects. Recently, emerging two-dimensional (2D) ferroelectricshave demonstrated their ability to maintain ferroelectricity at thenanoscale and have shown superior properties compared to three-dimensionalferroelectrics. Here, we report a ferroelectric field effect transistorcomposed of all 2D van der Waals (vdWs) heterostructures and providea comprehensive study of the modulation of ferroelectric polarizationon the carrier transport properties. Remarkably, the ferroelectricpolarization allowed for achieving an ultralow subthreshold swingof just 26 mV/dec and a high carrier mobility of up to 72.3 cm(2)/(V s) at a smaller drain voltage of 10 mV. These impressivecharacteristics offer new insights into evaluating the regulatoryeffect of ferroelectric polarization on the electrical propertiesof all 2D vdWs heterostructures.
引用
收藏
页码:6784 / 6791
页数:8
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