Titanium nitride (TiN) as a promising alternative to plasmonic metals: a comprehensive review of synthesis and applications

Titanium nitride (TiN), a prominent transition metal nitride (TMN), has garnered significant attention due to its exceptional characteristics and versatile applications in modern technologies. This comprehensive review highlights TiN's unique properties, positioning it as a promising alternative to traditional plasmonic metals due to its ability to overcome cost limitations and maintain plasmonic behaviour at lower temperatures. The paper presents recent research on TiN, encompassing various synthesis techniques, structural considerations, and its diverse range of applications. By focusing on the synthesis aspect, the review delves into the different methods employed to produce TiN, showcasing the breadth of available strategies. Additionally, the article sheds light on emerging applications where TiN demonstrates its prowess, such as solar energy acquisition, energy storage, photocatalysis, electrochemical sensing, biomedical implants, and protective coatings. Acknowledging the challenges and limitations of TiN, the review addresses potential areas for improvement and research directions. By offering a comprehensive analysis of TiN's capabilities, this review serves as an invaluable resource for researchers and scientists in the dynamic field of materials science and engineering. The synthesis strategies and extensive technological applications discussed here will undoubtedly inspire further exploration and innovation in using TiN for advancing cutting-edge technologies. Titanium nitride (TiN), a key transition metal nitride (TMN), stands out for its remarkable features, finding diverse applications in modern technologies.