The impact of hydrogen plasma on the structure and morphology of tin and lead micrometer sized particles

被引：9

作者：

Shefer, D. ^{[1
]}

Nikipelov, A. ^{[2
]}

van de Kerkhof, M. ^{[2
]}

Marvi, Z. ^{[2
]}

Banine, V ^{[1
,2
]}

Beckers, J. ^{[1
]}

机构：

[1] Eindhoven Univ Technol, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands

[2] The ASML, NL-5504 DR Veldhoven, Netherlands

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 2023年 / 56卷 / 08期

关键词：

EUV plasma; hydrogen plasma; contamination; tin; lead; particles; DECOMPOSITION; ALUMINUM; BUBBLES; SPECTRA;

D O I：

10.1088/1361-6463/acb3d9

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The stability of micrometer sized particles in hydrogen plasma is essential for extreme ultraviolet lithography, the ITER fusion program and the application of hydrogen plasma etching. We experimentally investigated the morphological evolution of tin (Sn), lead (Pb), and lead (II) oxide (PbO) micrometer sized particles on a surface that is exposed to a low pressure hydrogen plasma. Post exposure particle cross sections obtained by a scanning electron microscope accompanied by a focused ion beam demonstrated a significant influence of hydrogen plasma exposure on both the surface and the bulk material of the particles. Chemical sputtering at the surface and accumulation of pressurized hydrogen bubbles in cavities in the bulk material are the main drivers of the morphological changes. These mechanisms may influence the adhesion of particles to the surface through the introduction of asperities, increase of contact spot area, or fragmentation after the accumulation of mechanical stress.

引用

页数：9

共 47 条

[1] Astakhov DI, 2016, Arxiv, DOI [arXiv:1507.02705, 10.48550/arXiv.1507.02705, DOI 10.48550/ARXIV.1507.02705]
[2] Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen
Astakhov, D. I.
Goedheer, W. J.
Lee, C. J.
Ivanov, V. V.
Krivtsun, V. M.
Koshelev, K. N.
Lopaev, D. V.
van der Horst, R. M.
Beckers, J.
Osorio, E. A.
Bijkerk, F.
[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2016, 49 (29)
[3] EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology
Beckers, Job
van de Ven, Tijn
van der Horst, Ruud
Astakhov, Dmitry
Banine, Vadim
[J]. APPLIED SCIENCES-BASEL, 2019, 9 (14):
[4] Plasma-wall interaction studies within the EUROfusion consortium: progress on plasma-facing components development and qualification
Brezinsek, S.
Coenen, J. W.
Schwarz-Selinger, T.
Schmid, K.
Kirschner, A.
Hakola, A.
Tabares, F. L.
van der Meiden, H. J.
Mayoral, M. -L.
Reinhart, M.
Tsitrone, E.
Ahlgren, T.
Aints, M.
Airila, M.
Almaviva, S.
Alves, E.
Angot, T.
Anita, V.
Parra, R. Arredondo
Aumayr, F.
Balden, M.
Bauer, J.
Ben Yaala, M.
Berger, B. M.
Bisson, R.
Bjorkas, C.
Radovic, I. Bogdanovic
Borodin, D.
Bucalossi, J.
Butikova, J.
Butoi, B.
Cadez, I.
Caniello, R.
Caneve, L.
Cartry, G.
Catarino, N.
Cekada, M.
Ciraolo, G.
Ciupinski, L.
Colao, F.
Corre, Y.
Costin, C.
Craciunescu, T.
Cremona, A.
De Angeli, M.
de Castro, A.
Dejarnac, R.
Dellasega, D.
Dinca, P.
Dittmar, T.
[J]. NUCLEAR FUSION, 2017, 57 (11)
[5] HYDROGEN PLASMA-ETCHING OF SEMICONDUCTORS AND THEIR OXIDES
CHANG, RPH
CHANG, CC
DARACK, S
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (01): : 45 - 50
[6] Chase MW., 1998, J PHYS CHEM REFERENC
[7] A nucleation and growth model of vertically-oriented carbon nanofibers or nanotubes by plasma-enhanced catalytic chemical vapor deposition
Cojocaru, C. S.
Senger, A.
Le Normand, F.
[J]. JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2006, 6 (05) : 1331 - 1338
[8] HYDROGEN BUBBLES IN METALS
CONDON, JB
SCHOBER, T
[J]. JOURNAL OF NUCLEAR MATERIALS, 1993, 207 : 1 - 24
[9] Dean J A., 1999, Langes Handbook of Chemistry, V15th edn
[10] Modeling and measurement of hydrogen radical densities of in situ plasma-based Sn cleaning source
Elg, Daniel T.
Panici, Gianluca A.
Peck, Jason A.
Srivastava, Shailendra N.
Ruzic, David N.
[J]. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2017, 16 (02):

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