Three-phase contact line confined dense nanoparticle array for high-capacity DNA synthesis

This paper presents a facile and cost-effective fabrication method of microreactor array chip for high-throughput DNA synthesis with three orders of mangnitude enhancement in synthesis capacity. Inkjet printing was used to dispense a massive droplet array of silica nanoparticle slurry on chemically-modified surface. Dense microreactor array can be simply obtained by following the procedure of three-phase contact line (TCL)-confined nanoparticle aggregating, which is dominated by the receding contact angle (RCA) of the modified substrates. Chip with RCAs greater than 90 degrees transfers the resultant force to a lifting statu as well as enhances the inward force effect, which leading to a dense and compact packing synergistically on limited chip area. Herein, a consequential increasement in effective reaction area contributes to the significant enhancement in synthesis capacity as compared to a planar or porous substtrate. The proposed microarray chip demonstrates great prospects for both highthroughput and high-capacity DNA synthesis.