Super-Nernstian WSe2/MoS2 Heterostructure ISFET Combining Negative Capacitance and Charge Screening Effects

被引:10
|
作者
Sanjay, Sooraj [1 ]
Sakib, Fahimul Islam [2 ]
Hossain, Mainul [2 ]
Bhat, Navakanta [1 ]
机构
[1] Indian Inst Sci, Ctr Nano Sci & Engn, Bengaluru 560012, India
[2] Univ Dhaka, Dept Elect & Elect Engn, Dhaka 1000, Bangladesh
关键词
Heterostructure; ion-sensitive field effect transistors (ISFETs); MoS2; NCFETs; negative capacitance (NC); super-Nernstian; technology computer-aided (TCAD); WSe2; FIELD-EFFECT TRANSISTORS; TOP GATE; PERFORMANCE; MODEL; SENSITIVITY; SILICON; LIMIT; MFIS; TCAD;
D O I
10.1109/JSEN.2023.3270189
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We propose an ultra-scalable, highly sensitive, and label-free pH sensor by incorporating a negative capacitance (NC) effect with a 2-D WSe2/MoS2 heterostructure-based ion-sensitive field effect transistor (ISFET). The combination of electrostatic screening in 2-D WSe2/MoS2 heterostructure with the inclusion of the NC effect in the fluid gate offers tremendous enhancement in sensitivity. The sensor performance is evaluated by combining the numerical solutions of the 1-D Landau-Khalatnikov (L-K) equation with the experiment-calibrated technology computer-aided (TCAD) simulations of the WSe2/MoS2 ISFET. The proposed device shows a maximum voltage sensitivity of 4.38 V/pH with excellent noise performance leading to an enhanced resolution of 0.002 units of pH. The NC-WSe2/MoS2-ISFET demonstrated similar to 15x and similar to 8x improvement in sensitivity, respectively, when compared to WSe2/MoS2 and NC-WSe2 baseline ISFET counterparts. The device design is amenable to scaling due to the use of an atomically thin 2-D channel and ultrathin layer of high-k (HfO2) gate dielectric. The use of the NC effect in a 2-D heterostructure ISFET paves the way for the next generation of highly sensitive and label-free biosensors for point-of-care diagnostics.
引用
收藏
页码:12526 / 12535
页数:10
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