Customizable and Reconfigurable Surface Properties of Printed Micro-objects by 3D Direct Laser Writing via Nitroxide Mediated Photopolymerization

被引:23
作者
Belqat, Mehdi [1 ,2 ]
Wu, Xingyu [1 ,2 ]
Morris, Jason [3 ]
Mougin, Karine [1 ,2 ]
Petithory, Tatiana [1 ,2 ]
Pieuchot, Laurent [1 ,2 ]
Guillaneuf, Yohann [3 ]
Gigmes, Didier [3 ]
Clement, Jean-Louis [3 ]
Spangenberg, Arnaud [1 ,2 ]
机构
[1] Univ Haute Alsace, CNRS, IS2M UMR 7361, F-68100 Mulhouse, France
[2] Univ Strasbourg, Strasbourg, France
[3] Aix Marseille Univ, ICR UMR7273, CNRS, F-13397 Marseille, France
关键词
alkoxyamine; 3D direct laser writing; nitroxide-mediated photopolymerization; reversible deactivation radical polymerization; two-photon polymerization; ALKOXYAMINES; GELS;
D O I
10.1002/adfm.202211971
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Photoactivated Reversible Deactivation Radical Polymerization (RDRP) technologies have emerged very recently in the field of 3D printing systems especially at the macroscale in vat-photopolymerization-based processes such as digital light processing (DLP). Contrary to conventional free radical photopolymerization, photoRDRP in 3D printing leads to 3D objects with living character and thus confers them the unique ability to be post-modified after fabrication. While 3D direct laser writing (3D DLW) by two photon polymerization has become a standard for fabrication of complex 3D micro-objects, the use of RDRP and its associated benefits has so far been under-investigated at that scale. Herein, a photoresist suitable for 3D DLW based on nitroxide mediated photopolymerization (NMP2) is developed. The photopolymerization efficiency for fabrication of micro-structures and their subsequent post-modification are investigated regarding the laser power and the wavelength of excitation. Moreover, highly tunable, precise, and successive surface patterning of 2D and 3D multi-material microstructures are demonstrated thanks to the spatial and temporal control offered by the photo-induced post-modification. This work highlights new directions to be explored in order to accelerate the adoption of RDRP in 3D printing based on photopolymerization.
引用
收藏
页数:9
相关论文
共 37 条
  • [1] Asadi-Eydivand M, 2022, ACS APPL POLYM MATER, V4, P4940, DOI 10.1021/acsapm.2c00500
  • [2] Living Polymer Networks Based on a RAFT Cross-Linker: Toward 3D and 4D Printing Applications
    Bagheri, Ali
    Ling, Honglei
    Bainbridge, Chris William Anderson
    Jin, Jianyong
    [J]. ACS APPLIED POLYMER MATERIALS, 2021, 3 (06): : 2921 - 2930
  • [3] Reversible Deactivation Radical Polymerization: From Polymer Network Synthesis to 3D Printing
    Bagheri, Ali
    Fellows, Christopher M.
    Boyer, Cyrille
    [J]. ADVANCED SCIENCE, 2021, 8 (05)
  • [4] Oxygen Tolerant PET-RAFT Facilitated 3D Printing of Polymeric Materials under Visible LEDs
    Bagheri, Ali
    Bainbridge, Chris William Anderson
    Engel, Kyle Edward
    Qiao, Greg G.
    Xu, Jiangtao
    Boyer, Cyrille
    Jin, Jianyong
    [J]. ACS APPLIED POLYMER MATERIALS, 2020, 2 (02): : 782 - 790
  • [5] 3D printing of polymeric materials based on photo-RAFT polymerization
    Bagheri, Ali
    Engel, Kyle Edward
    Bainbridge, Chris William Anderson
    Xu, Jiangtao
    Boyer, Cyrille
    Jin, Jianyong
    [J]. POLYMER CHEMISTRY, 2020, 11 (03) : 641 - 647
  • [6] Acrylic-based resin with favorable properties for three-dimensional two-photon polymerization
    Baldacchini, T
    LaFratta, CN
    Farrer, RA
    Teich, MC
    Saleh, BEA
    Naughton, MJ
    Fourkas, JT
    [J]. JOURNAL OF APPLIED PHYSICS, 2004, 95 (11) : 6072 - 6076
  • [7] 3D Laser Micro- and Nanoprinting: Challenges for Chemistry
    Barner-Kowollik, Christopher
    Bastmeyer, Martin
    Blasco, Eva
    Delaittre, Guillaume
    Mueller, Patrick
    Richter, Benjamin
    Wegener, Martin
    [J]. ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, 2017, 56 (50) : 15828 - 15845
  • [8] Light-Sensitive Alkoxyamines as Versatile Spatially- and Temporally-Controlled Precursors of Alkyl Radicals and Nitroxides
    Baron, Marc
    Morris, Jason C.
    Telitel, Siham
    Clement, Jean-Louis
    Lalevee, Jacques
    Morlet-Savary, Fabrice
    Spangenberg, Arnaud
    Malval, Jean-Pierre
    Soppera, Olivier
    Gigmes, Didier
    Guillaneuf, Yohann
    [J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2018, 140 (09) : 3339 - 3344
  • [9] Tuning nanomechanical properties of microstructures made by 3D direct laser writing
    Belqat, Mehdi
    Wu, Xingyu
    Gomez, Laura Piedad Chia
    Malval, Jean-Pierre
    Dominici, Sebastien
    Leuschel, Benjamin
    Spangenberg, Arnaud
    Mougin, Karine
    [J]. ADDITIVE MANUFACTURING, 2021, 47
  • [10] The Emergence of Reversible-Deactivation Radical Polymerization in 3D Printing
    Bobrin, Valentin A.
    Zhang, Jin
    Corrigan, Nathaniel
    Boyer, Cyrille
    [J]. ADVANCED MATERIALS TECHNOLOGIES, 2023, 8 (05):