In-situ spectral reflectance investigation of hetero-epitaxially grown β-Ga2O3 thin films on c-plane Al2O3 via MOVPE process

被引:2
作者
Chou, Ta-Shun [1 ]
Bin Anooz, Saud [1 ]
Grueneberg, Raimund [1 ]
Rehm, Jana [1 ]
Akhtar, Arub [1 ]
Mukherjee, Deshabrato [2 ,3 ]
Petrik, Peter [2 ,4 ]
Popp, Andreas [1 ]
机构
[1] Leibniz Inst Kristallzuchtung IKZ, Max Born Str,2, D-12489 Berlin, Germany
[2] Inst Tech Phys & Mat Sci, Ctr Energy Res, Konkoly Thege Mikl Str 29-33, H-1121 Budapest, Hungary
[3] Obuda Univ, Doctoral Sch Mat Sci & Technol, Budapest, Hungary
[4] Univ Debrecen, Fac Sci & Technol, POB 400, H-4002 Debrecen, Hungary
关键词
A1; Surfaces; A3. Metalorganic vapor phase epitaxy; B1. Gallium compounds; OPTICAL-PROPERTIES; REFRACTIVE-INDEX; GALLIUM OXIDE; SAPPHIRE; SURFACES; LAYERS;
D O I
10.1016/j.apsusc.2024.159370
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Metalorganic vapor-phase epitaxy of beta-Ga2O3/c-plane Al2O3 heterostructures was monitored in -situ by spectral reflectance in different wavelengths. The reflectance spectrum was analysed as a function of the growth time and the incident wavelength to estimate the growth rate and the refractive index at the growth temperatures. The obtained values are validated by ex -situ methods such as secondary ion mass spectrum measurement and spectroscopic ellipsometry. A theoretical simulation of the reflectance spectrum was carried out by combining a transfer matrix method with a multilayer model, and a good agreement with the experimental results is presented.
引用
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页数:7
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